Browse "PH-Conference Papers(학술회의논문)" by Author 607

Showing results 1 to 60 of 67

1
A Study on Characteristics of SF6/O2 Capacitive Discharge with QMS and Langmuir Probe

Chang, Hong-Young; Lee, HS; Ahn, SK; You, SJ, AEPSE 2007, AEPSE, 2007

2
A Study on the Formation and Characteristics of a-Fluoronated Carbon Films by CF4/CH4-ICPCVD

Chang, Hong-Young, The ELECTROCHEMICAL SOCIETY 197th Meeting, The ELECTROCHEMICAL SOCIETY, 2000

3
A Study on the Neutral Distributions through Spatial Profile of Plasma Emission in High Density Plasma

Chang, Hong-Young, The 3rd Asia-Pacific Conference On Plasma Science and Technology, Plasma Science and Technology, 1996

4
Analysis of Plasma Electrical Characteristics during Arcing and the Development of Arcing Detector in rf Discharges

Chang, Hong-Young; K, Y, AVS 54th International Symposium & Exhibition, AVS, 2007

5
Characteristics of a new high frequency inductively coupled plama source

Lee, DS; Chang, Hong-Young, 54th Annual Gaseous Electronics Conference, 2001-10

6
Characterization of an inductively coupled Cl2/Ar plasma and its application to Cu etching

Seo, SH; Kim, JH; Lee, PW; Chang, Hong-Young, The Electrochemical society meeting, The Electrochemical Society, 1995

7
Control of electron temperature using grid bias voltage and its application to etching using fluorocarbon gases.

Bai, KH; Hong, JI; You, SJ; Chang, Hong-Young, ESFC-13, ESFC, 2001

8
Determination of the Relative F Concentration and its Radial Profile by Plasma Parameter Normalization in and Electron cyclotron Resonance SF6/Ar Discharge

Kim, YJ; Lee, PW; Chang, Hong-Young, ECS Meeting , The electrochemical society, 1995

9
Development of Dual-Frequency Inductively Coupled Plasma and Control of Plasma Parameters Changing the Power Ratio between High-and Low-Frequency rf Sources

Seo, S; Lee, H; Chang, Hong-Young, AVS 53rd International Symposium&Exhibition, AVS, 2006

10
Diagnostics for the Korea Superconducting Tokamak Advanced Research(KSTAR)Progect

Chang, Hong-Young, 17th SOFE Conference, SOFE, 1997

11
EEDF Measurements in Dual Frequency Capacitively Coupled Plasma(CCP) and Comparison with PIC Simulation

Jeon, B.I.; Chang, Hong-Young; Shon, J., 2003 IEEE International Conference on Plasma Science, pp.423 -, IEEE, 2003-06-02

12
EEDF measurements in dual frequency capacitively coupled plasma(CCP).

Jeon, B; Shon, J; Chang, Hong-Young, The 30th IEEE International Conference on Plasma Science , IEEE, 2003-06

13
Effect of bounce resonance heating on electron energy distribution function

Chung, C; Seo, S; Chang, Hong-Young, 52nd Annual Gaseous Electronic Conference, American Physical Society, 1999-10

14
Effect of bounce resonance heating on Electron Energy Distribution Function in a small Inductively Coupled Plasma

정진욱; 서상훈; 장홍영, 한국진공학회 제17회 학술발표회, 한국진공학회, 1999-07

15
Electrical Characteristics of the Dual Frequency Capacitively Coupled Plasma(CCP)

Jeon B.I.; Chang, Hong-Young; Shon J., IEEE International Conference on Plasma Science, 2003, pp.423 -, IEEE, 2003-06-02

16
Electron Temperature control in ICP using grid and its use for control the ion ratio in CF4 / Ar plasma

Bai, KH; Hong, JI; Kim, SS; Chang, Hong-Young, 53rd Annual Gaseous Electronic Conference, APS Physics, 2000

17
Electron temperature control with grid in inductively coupled Ar plasma

Hong, IH; Seo, SH; Chang, Hong-Young, 43th International symp.American Vac. Soc, American Vacuum Society, 1996

18
Evolution of the electron energy distribution function and nonlocal electron kinetics in a planar inductive discharge.

Chang, Hong-Young, 5Th Asia-Pacific Conference on plasma science & Technology, 13th symposium on plasma science for materials, plasma science & Technology, 2000

19
Evolution of the electron energy distribution function in planar inductive discharges using rare gases

Seo, S; Kim, S; Hong, J; Chang, C; Chang, Hong-Young, 52nd Annual Gaseous Electronic Conference, American Physical Society, 1999-10

20
Examination on the validity of plasma parameter normalization method(PPNM) for the determination of the relative concentration of F radical atoms

Moon, SJ; Kim, YJ; Chang, Choong-Seock; Chang, Hong-Young, The 2nd Asia-Pacific Conference on Plasma Science and Thechnology, Plasma Science and Thechnology, 1995

21
Experimental investigation of plasma dynamics in dc and short-pulse magnetron discharges

Seo, S.-H.; In, J.-H.; Chang, Hong-Young, Plasma Sources Science and Technology, pp.256 - 265, Plasma Sources Science and Technology, 2006

22
Half-Dimensional Model of the Plasma Distribution in ECR Plasma

Moon, SJ; Kim, YJ; Chang, Choong-Seock; Chang, Hong-Young, The 2nd Asia-Pacific Conference on Plasma Science and Technology, 1995

23
Heating mode transition in the capacitive mode of inductively coupled plasma and the electron temperature change during the E-H transition

Chung, C.W.; Kim, S.S.; Chang, Hong-Young, 2002 IEEE International Conference on plasma Science, pp.290 -, IEEE, 2002-05-26

24
Helicon wave plasma production and study of its characteristics

Kim, J.H.; Song, S.K.; Chang, Hong-Young, The IEEE International Conference on Plasma Science, pp.137 -, IEEE, 1994-06-06

25
Mach probe in electron cyclotron resonance plasma

Chang, Hong-Young; Lee, PW, 2nd APCPST, APCPST, 1995

26
Mach probe measurement of flow velocity in RF plasma

Yang Jang Gyoo; Chang, Hong-Young, The IEEE International Conference on Plasma Science, pp.179 -, IEEE, 1994-06-06

27
Measurement of Ion Energy Distribution in Dual Frequency Capacitively Coupled Plasma

Chang, Hong-Young; Seo, SH; Lee, HS; Lee, JB, AVS 54th International Symposium & Exhibition, AVS, 2007

28
New Plasma Source Development Using a Parallel Resonance Antenna for Dry Etching

Kwon, G.-C.; Kim, H.-S.; Kim, J.-S.; Choi, S.-H.; Jun, J.-H.; Lee, D.S.; Lee, Y.K.; et al, 2003 IEEE International Conference on Plasma Science, pp.403 -, IEEE, 2003-06-02

29
Nonlocal Electron Kinetics in a Planar Inductive Discharge

Chang, Hong-Young, 17th Symposium on plasma processing(SPP17), 2000

30
On the Inductively Coupled Plasma for the Next - Generation Processing.

Chang, Hong-Young, International Workshop of Particle Beams & Plasma Interaction on Materials, Particle Beams & Plasma Interaction on Materials, 2002

31
On the Inductively Coupled Plasma for the Next - Generation Processing.

Chang, Hong-Young, Frontiers of Surface Engineering 2001 (FSE 2001) Conference and Exhibition, Frontiers of Surface Engineering, 2001

32
On the Inductively Coupled Plasma for the Next - Generation Processing.

Chang, Hong-Young, The Twelfth Gaseous Electronics Meeting , 2002

33
Performance Characteristics of Inductively Coupled rf Ion Source for Low-energy Neutral Beam

Chang, Hong-Young; Park, M., AVS 54th International Symposium & Exhibition, AVS, 2007

34
Plasma Characterization of 2, 27 MHz Dual Frequency Capacitively Coupled Plasma(CCP)

Chang, Hong-Young; Jeon, B, 6th APCPST, APCPST, 2002-07

35
Plasma parameter control studies for next generation plasma processing

장홍영, 한국물리학회 학술대회, 한국물리학회, 2003

36
Plasma parameter control studies in next generation processing

장홍영, SEMICON KOREA 2003, SEMICON, 2003-01

37
Plasmas Generated by Axisymmetric Helicon Antenna

Uhm, HS; Uhm, SH; Chang, Hong-Young, 43rd Annual Meeting of the APS Division of Plasma Physics , APS, 2001

38
power dissipation mode transition by a magnetic field

유신재; 정진욱; 배근희; 장홍영, 한국진공학회 2002년도 제23회 학술발표회, 한국진공학회, 2002

39
Power Dissipation Mode Transition Induced by a Driving Frequency Increase in Capacitively Coupled Plasma

You, S.J.; Kim, H.C.; Chang, Hong-Young; Lee, J.K., 2003 IEEE International Conference on Plasma Science, pp.352 -, IEEE, 2003-06-02

40
Pressure limitation of electron density measurement using a wave-cutoff method in weakly ionized plasmas

Na, BK,; Lee, YS; Jun, HS; Chang, Hong-Young, 2009 IEEE International Conference on Plasma Science - Abstracts, ICOPS 2009, IEEE, 2009-06-01

41
Production of high density plasma on the substrate in a helicon source and application to the deposition of SiOF film with low dielectric constant

Kim, JH; Seo, SH; Yun, SM; Chang, Hong-Young, The Electrochemical society meeting, The Electrochemical society, 1995

42
Properties of plasma generated by a sheat-helix antenna

Chang, Hong-Young, 28th IEEE International Conference on Plasma Science(ICOPS) and 13th IEEE International Pulsed Power Conference (PPC), IEEE, 2001-06-17

43
Properties of Plasmas generated by a Sheath-Helix Antenna

Uhm, HS; Uhm, SH; Chang, Hong-Young, IEEE PPPS 2002, IEEE, 2002

44
Properties of plasmas generated by a single-turn antenna at lower-hybrid frequency

Uhm, S.; Uhm, H.S.; Chang, Hong-Young, 2002 29th IEEE International Conference on plasma Science, pp.223 -, IEEE, 2002-05-26

45
Real Time Intrusive Optical emission spectroscopy for process control

Lee, PW; Kim, YJ; Seo, SH; Kim, JH; Chang, Hong-Young, , 1995

46
Review of heating mechanism research in inductively coupled plasma

Chang, Hong-Young, The 2nd Asian-European International Conference on Plasma Surface Engineering, 1999

47
Spark gap produced plasma diagnostics

Chang, Hong-Young, 1990 IEEE International Conference on Plasma Science, pp.100 -, IEEE, 1990-05-21

48
Status and characteristics of diagnostics on Korea Superconducting Tokamak Research(KSTAR)

Chang, Hong-Young, , 1996

49
Study of Helicon Wave Plasma Production and Its Characteristics

Kim, JH; Seo, SH; Kim, YJ; Lee, PW; Chang, Hong-Young, 2nd APCPST, APCPST, 1994

50
The deposition of SiOF film with low dielectric constant in a helicon plasma source

Kim, JH; Seo, SH; Yun, SM; Lee, KM; Choi, CK; Chang, Hong-Young, 3rd Asia-Pacific Conference on Plasma Science & Technology, Plasma Science & Technology, 1996

51
The Effect of pressure and gas species on Electron Cyclotron Resonance (ECR) in a weakly magnetized Inductively Coupled Plasma(ICP)

Chung, W; Kim, SS; Lee, SW; You, SJ; Chang, Hong-Young, 54th Annual Gaseous Electronics Conference, 2001-10

52
The Effects of Electrostatic Bias on the Radial Plasma Potential Profile in a Helicon Plasma

Lee, SW; Chang, Hong-Young, AVS 47th International Symposium, AVS, 2000

53
The electron cyclotron resonance in a weakly magnetized radio frequency inductive discharge

Chung, C; Chang, Hong-Young, 53rd ANNUAL GASEOUS ELECTRONICS CONFERENCE, APS Physics, 2000-10

54
Theoretical investigation of the evolution of electron energy distribution functions in inductively coupled discharges

Kim, S.S.; Chung, C.W.; Chang, Hong-Young, The Joint International Plasma Symposium, v.435, no.40545, pp.72 - 77, Thin Solid Films, 2002-07-01

55
Wave profile changes at lower hybrid resonance in Helicon plasma

엄세훈; 엄한섭; 장홍영, KAPRA & KPS/DPP Workshop 2000, KAPRA & KPS/DPP, 2000

56
고밀도 Helicon Plasma를 이용한 저유전율의 SiOF박막 증착 연구

김정형; 서상훈; 윤석민; 장홍영, 한국진공학회 제9회 학술발표회, 한국진공학회, 1995

57
고출력 펄스레이져에 의해서 생성되는 고온의 플라즈마 온도 측정

장홍영, 한국물리학회 학술발표회, 한국물리학회, 1988

58
그리드를 이용한 플라즈마 변수 제어에 따른 Ar/CF4 플라즈마에서 중성종 및 이온들의 분포변화

홍정인; 배근희; 서상훈; 장홍영, 한국진공학회 제17회 학술발표회, 한국진공학회, 1999

59
그리드를 장착한 DC 마그네트론 플라즈마의 플라즈마 특성 연구

인정환; 정민재; 한전건; 장홍영, 한국표면공학회 2003년도 춘계학술발표회, 한국표면공학회, 2003

60
두 개의 그리드를 이용한 개선된 마그네트론 플라즈마에서 플라즈마 특성 측정

인정환; 인정환; 장홍영, 한국진공학회 2003년도 제24회 학술발표회 , 한국진공학회, 2003

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