New Plasma Source Development Using a Parallel Resonance Antenna for Dry Etching

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Publisher
IEEE
Issue Date
2003-06-02
Language
ENG
Citation

2003 IEEE International Conference on Plasma Science, pp.403 -

ISSN
0730-9244
URI
http://hdl.handle.net/10203/140878
Appears in Collection
PH-Conference Papers(학술회의논문)
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