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College of Natural Sciences(자연과학대학)Dept. of Physics(물리학과)PH-Conference Papers(학술회의논문)

New Plasma Source Development Using a Parallel Resonance Antenna for Dry Etching

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dc.contributor.authorKwon, G.-C.-
dc.contributor.authorKim, H.-S.-
dc.contributor.authorKim, J.-S.-
dc.contributor.authorChoi, S.-H.-
dc.contributor.authorJun, J.-H.-
dc.contributor.authorLee, D.S.-
dc.contributor.authorLee, Y.K.-
dc.contributor.authorChang, Hong-Young-
dc.date.accessioned2013-03-17T06:57:52Z-
dc.date.available2013-03-17T06:57:52Z-
dc.date.created2012-02-06-
dc.date.issued2003-06-02-
dc.identifier.citation2003 IEEE International Conference on Plasma Science, v., no., pp.403 --
dc.identifier.issn0730-9244-
dc.identifier.urihttp://hdl.handle.net/10203/140878-
dc.languageENG-
dc.publisherIEEE-
dc.titleNew Plasma Source Development Using a Parallel Resonance Antenna for Dry Etching-
dc.typeConference-
dc.identifier.scopusid2-s2.0-0141893260-
dc.type.rimsCONF-
dc.citation.beginningpage403-
dc.citation.publicationname2003 IEEE International Conference on Plasma Science-
dc.identifier.conferencecountrySouth Korea-
dc.identifier.conferencecountrySouth Korea-
dc.contributor.localauthorChang, Hong-Young-
dc.contributor.nonIdAuthorKwon, G.-C.-
dc.contributor.nonIdAuthorKim, H.-S.-
dc.contributor.nonIdAuthorKim, J.-S.-
dc.contributor.nonIdAuthorChoi, S.-H.-
dc.contributor.nonIdAuthorJun, J.-H.-
dc.contributor.nonIdAuthorLee, D.S.-
dc.contributor.nonIdAuthorLee, Y.K.-
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PH-Conference Papers(학술회의논문)
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