Development of Dual-Frequency Inductively Coupled Plasma and Control of Plasma Parameters Changing the Power Ratio between High-and Low-Frequency rf Sources

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Publisher
AVS
Issue Date
2006
Language
ENG
Citation

AVS 53rd International Symposium&Exhibition

URI
http://hdl.handle.net/10203/148319
Appears in Collection
PH-Conference Papers(학술회의논문)
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