Development of Dual-Frequency Inductively Coupled Plasma and Control of Plasma Parameters Changing the Power Ratio between High-and Low-Frequency rf Sources

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dc.contributor.authorSeo, S-
dc.contributor.authorLee, H-
dc.contributor.authorChang, Hong-Young-
dc.date.accessioned2013-03-18T12:20:08Z-
dc.date.available2013-03-18T12:20:08Z-
dc.date.created2012-02-06-
dc.date.issued2006-
dc.identifier.citationAVS 53rd International Symposium&Exhibition, v., no., pp. --
dc.identifier.urihttp://hdl.handle.net/10203/148319-
dc.languageENG-
dc.publisherAVS-
dc.titleDevelopment of Dual-Frequency Inductively Coupled Plasma and Control of Plasma Parameters Changing the Power Ratio between High-and Low-Frequency rf Sources-
dc.typeConference-
dc.type.rimsCONF-
dc.citation.publicationnameAVS 53rd International Symposium&Exhibition-
dc.identifier.conferencecountryUnited States-
dc.identifier.conferencecountryUnited States-
dc.contributor.localauthorChang, Hong-Young-
dc.contributor.nonIdAuthorSeo, S-
dc.contributor.nonIdAuthorLee, H-
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PH-Conference Papers(학술회의논문)
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