Browse "PH-Conference Papers(학술회의논문)" by Author Chang, Hong-Young
Showing results 1 to 50 of 50
| A Study on Characteristics of SF6/O2 Capacitive Discharge with QMS and Langmuir Probe Chang, Hong-Young; Lee, HS; Ahn, SK; You, SJ, AEPSE 2007, AEPSE, 2007 |
| A Study on the Formation and Characteristics of a-Fluoronated Carbon Films by CF4/CH4-ICPCVD Chang, Hong-Young, The ELECTROCHEMICAL SOCIETY 197th Meeting, The ELECTROCHEMICAL SOCIETY, 2000 |
| A Study on the Neutral Distributions through Spatial Profile of Plasma Emission in High Density Plasma Chang, Hong-Young, The 3rd Asia-Pacific Conference On Plasma Science and Technology, Plasma Science and Technology, 1996 |
| Analysis of Plasma Electrical Characteristics during Arcing and the Development of Arcing Detector in rf Discharges Chang, Hong-Young; K, Y, AVS 54th International Symposium & Exhibition, AVS, 2007 |
| Characteristics of a new high frequency inductively coupled plama source Lee, DS; Chang, Hong-Young, 54th Annual Gaseous Electronics Conference, 2001-10 |
| Characterization of an inductively coupled Cl2/Ar plasma and its application to Cu etching Seo, SH; Kim, JH; Lee, PW; Chang, Hong-Young, The Electrochemical society meeting, The Electrochemical Society, 1995 |
| Control of electron temperature using grid bias voltage and its application to etching using fluorocarbon gases. Bai, KH; Hong, JI; You, SJ; Chang, Hong-Young, ESFC-13, ESFC, 2001 |
| Determination of the Relative F Concentration and its Radial Profile by Plasma Parameter Normalization in and Electron cyclotron Resonance SF6/Ar Discharge Kim, YJ; Lee, PW; Chang, Hong-Young, ECS Meeting , The electrochemical society, 1995 |
| Development of Dual-Frequency Inductively Coupled Plasma and Control of Plasma Parameters Changing the Power Ratio between High-and Low-Frequency rf Sources Seo, S; Lee, H; Chang, Hong-Young, AVS 53rd International Symposium&Exhibition, AVS, 2006 |
| Diagnostics for the Korea Superconducting Tokamak Advanced Research(KSTAR)Progect Chang, Hong-Young, 17th SOFE Conference, SOFE, 1997 |
| EEDF Measurements in Dual Frequency Capacitively Coupled Plasma(CCP) and Comparison with PIC Simulation Jeon, B.I.; Chang, Hong-Young; Shon, J., 2003 IEEE International Conference on Plasma Science, pp.423 -, IEEE, 2003-06-02 |
| EEDF measurements in dual frequency capacitively coupled plasma(CCP). Jeon, B; Shon, J; Chang, Hong-Young, The 30th IEEE International Conference on Plasma Science , IEEE, 2003-06 |
| Effect of bounce resonance heating on electron energy distribution function Chung, C; Seo, S; Chang, Hong-Young, 52nd Annual Gaseous Electronic Conference, American Physical Society, 1999-10 |
| Electrical Characteristics of the Dual Frequency Capacitively Coupled Plasma(CCP) Jeon B.I.; Chang, Hong-Young; Shon J., IEEE International Conference on Plasma Science, 2003, pp.423 -, IEEE, 2003-06-02 |
| Electron Temperature control in ICP using grid and its use for control the ion ratio in CF4 / Ar plasma Bai, KH; Hong, JI; Kim, SS; Chang, Hong-Young, 53rd Annual Gaseous Electronic Conference, APS Physics, 2000 |
| Electron temperature control with grid in inductively coupled Ar plasma Hong, IH; Seo, SH; Chang, Hong-Young, 43th International symp.American Vac. Soc, American Vacuum Society, 1996 |
| Evolution of the electron energy distribution function and nonlocal electron kinetics in a planar inductive discharge. Chang, Hong-Young, 5Th Asia-Pacific Conference on plasma science & Technology, 13th symposium on plasma science for materials, plasma science & Technology, 2000 |
| Evolution of the electron energy distribution function in planar inductive discharges using rare gases Seo, S; Kim, S; Hong, J; Chang, C; Chang, Hong-Young, 52nd Annual Gaseous Electronic Conference, American Physical Society, 1999-10 |
| Examination on the validity of plasma parameter normalization method(PPNM) for the determination of the relative concentration of F radical atoms Moon, SJ; Kim, YJ; Chang, Choong-Seock; Chang, Hong-Young, The 2nd Asia-Pacific Conference on Plasma Science and Thechnology, Plasma Science and Thechnology, 1995 |
| Experimental investigation of plasma dynamics in dc and short-pulse magnetron discharges Seo, S.-H.; In, J.-H.; Chang, Hong-Young, Plasma Sources Science and Technology, pp.256 - 265, Plasma Sources Science and Technology, 2006 |
| Half-Dimensional Model of the Plasma Distribution in ECR Plasma Moon, SJ; Kim, YJ; Chang, Choong-Seock; Chang, Hong-Young, The 2nd Asia-Pacific Conference on Plasma Science and Technology, 1995 |
| Heating mode transition in the capacitive mode of inductively coupled plasma and the electron temperature change during the E-H transition Chung, C.W.; Kim, S.S.; Chang, Hong-Young, 2002 IEEE International Conference on plasma Science, pp.290 -, IEEE, 2002-05-26 |
| Helicon wave plasma production and study of its characteristics Kim, J.H.; Song, S.K.; Chang, Hong-Young, The IEEE International Conference on Plasma Science, pp.137 -, IEEE, 1994-06-06 |
| Mach probe in electron cyclotron resonance plasma Chang, Hong-Young; Lee, PW, 2nd APCPST, APCPST, 1995 |
| Mach probe measurement of flow velocity in RF plasma Yang Jang Gyoo; Chang, Hong-Young, The IEEE International Conference on Plasma Science, pp.179 -, IEEE, 1994-06-06 |
| Measurement of Ion Energy Distribution in Dual Frequency Capacitively Coupled Plasma Chang, Hong-Young; Seo, SH; Lee, HS; Lee, JB, AVS 54th International Symposium & Exhibition, AVS, 2007 |
| New Plasma Source Development Using a Parallel Resonance Antenna for Dry Etching Kwon, G.-C.; Kim, H.-S.; Kim, J.-S.; Choi, S.-H.; Jun, J.-H.; Lee, D.S.; Lee, Y.K.; et al, 2003 IEEE International Conference on Plasma Science, pp.403 -, IEEE, 2003-06-02 |
| Nonlocal Electron Kinetics in a Planar Inductive Discharge Chang, Hong-Young, 17th Symposium on plasma processing(SPP17), 2000 |
| On the Inductively Coupled Plasma for the Next - Generation Processing. Chang, Hong-Young, International Workshop of Particle Beams & Plasma Interaction on Materials, Particle Beams & Plasma Interaction on Materials, 2002 |
| On the Inductively Coupled Plasma for the Next - Generation Processing. Chang, Hong-Young, Frontiers of Surface Engineering 2001 (FSE 2001) Conference and Exhibition, Frontiers of Surface Engineering, 2001 |
| On the Inductively Coupled Plasma for the Next - Generation Processing. Chang, Hong-Young, The Twelfth Gaseous Electronics Meeting , 2002 |
| Performance Characteristics of Inductively Coupled rf Ion Source for Low-energy Neutral Beam Chang, Hong-Young; Park, M., AVS 54th International Symposium & Exhibition, AVS, 2007 |
| Plasma Characterization of 2, 27 MHz Dual Frequency Capacitively Coupled Plasma(CCP) Chang, Hong-Young; Jeon, B, 6th APCPST, APCPST, 2002-07 |
| Plasmas Generated by Axisymmetric Helicon Antenna Uhm, HS; Uhm, SH; Chang, Hong-Young, 43rd Annual Meeting of the APS Division of Plasma Physics , APS, 2001 |
| Power Dissipation Mode Transition Induced by a Driving Frequency Increase in Capacitively Coupled Plasma You, S.J.; Kim, H.C.; Chang, Hong-Young; Lee, J.K., 2003 IEEE International Conference on Plasma Science, pp.352 -, IEEE, 2003-06-02 |
| Pressure limitation of electron density measurement using a wave-cutoff method in weakly ionized plasmas Na, BK,; Lee, YS; Jun, HS; Chang, Hong-Young, 2009 IEEE International Conference on Plasma Science - Abstracts, ICOPS 2009, IEEE, 2009-06-01 |
| Production of high density plasma on the substrate in a helicon source and application to the deposition of SiOF film with low dielectric constant Kim, JH; Seo, SH; Yun, SM; Chang, Hong-Young, The Electrochemical society meeting, The Electrochemical society, 1995 |
| Properties of plasma generated by a sheat-helix antenna Chang, Hong-Young, 28th IEEE International Conference on Plasma Science(ICOPS) and 13th IEEE International Pulsed Power Conference (PPC), IEEE, 2001-06-17 |
| Properties of Plasmas generated by a Sheath-Helix Antenna Uhm, HS; Uhm, SH; Chang, Hong-Young, IEEE PPPS 2002, IEEE, 2002 |
| Properties of plasmas generated by a single-turn antenna at lower-hybrid frequency Uhm, S.; Uhm, H.S.; Chang, Hong-Young, 2002 29th IEEE International Conference on plasma Science, pp.223 -, IEEE, 2002-05-26 |
| Real Time Intrusive Optical emission spectroscopy for process control Lee, PW; Kim, YJ; Seo, SH; Kim, JH; Chang, Hong-Young, , 1995 |
| Review of heating mechanism research in inductively coupled plasma Chang, Hong-Young, The 2nd Asian-European International Conference on Plasma Surface Engineering, 1999 |
| Spark gap produced plasma diagnostics Chang, Hong-Young, 1990 IEEE International Conference on Plasma Science, pp.100 -, IEEE, 1990-05-21 |
| Status and characteristics of diagnostics on Korea Superconducting Tokamak Research(KSTAR) Chang, Hong-Young, , 1996 |
| Study of Helicon Wave Plasma Production and Its Characteristics Kim, JH; Seo, SH; Kim, YJ; Lee, PW; Chang, Hong-Young, 2nd APCPST, APCPST, 1994 |
| The deposition of SiOF film with low dielectric constant in a helicon plasma source Kim, JH; Seo, SH; Yun, SM; Lee, KM; Choi, CK; Chang, Hong-Young, 3rd Asia-Pacific Conference on Plasma Science & Technology, Plasma Science & Technology, 1996 |
| The Effect of pressure and gas species on Electron Cyclotron Resonance (ECR) in a weakly magnetized Inductively Coupled Plasma(ICP) Chung, W; Kim, SS; Lee, SW; You, SJ; Chang, Hong-Young, 54th Annual Gaseous Electronics Conference, 2001-10 |
| The Effects of Electrostatic Bias on the Radial Plasma Potential Profile in a Helicon Plasma Lee, SW; Chang, Hong-Young, AVS 47th International Symposium, AVS, 2000 |
| The electron cyclotron resonance in a weakly magnetized radio frequency inductive discharge Chung, C; Chang, Hong-Young, 53rd ANNUAL GASEOUS ELECTRONICS CONFERENCE, APS Physics, 2000-10 |
| Theoretical investigation of the evolution of electron energy distribution functions in inductively coupled discharges Kim, S.S.; Chung, C.W.; Chang, Hong-Young, The Joint International Plasma Symposium, v.435, no.40545, pp.72 - 77, Thin Solid Films, 2002-07-01 |
Discover
Type
- 2 Article
- 4,334 Conference
Date issued
- 306 2020 - 2024
- 1,344 2010 - 2019
- 1,118 2000 - 2009
- 1,179 1990 - 1999
- 327 1980 - 1989