Browse "CH-Conference Papers(학술회의논문)" by Author Kim, Jin-Baek
Showing results 1 to 60 of 151
| A Combined Approach of Molecular-Assembly and Photolithography to Produce Biocompatible Micropatterns Lee, Hyun-Jung; Kim, Jin-Baek, European Materials Research Society, pp.0 - 0, 2008-05-26 |
| A Combined Approach of Molecular-Assembly and Photolithography to Produce Biocompatible Micropatterns Lee, Hyun-Jung; Ganesan, Ramakrishnan; Min, Chang-su; Kim, Jin-Baek, American Chemical Society, 2008-08-17 |
| A PED-stabilized Chemically Amplified Resist Kim, Jin-Baek; Choi, Jae-Hak; Jung, Min Ho; Kim, Hyun-Woo, 한국고분자학회 1997년도 추계 학술대회 , pp.329 - 330, 한국고분자학회, 1997-10-11 |
| A study on evaporation of photogenerated acid and base additives in chemically amplified positive resists Kim, Jin-Baek; Kwon, Young-Gil; Choi, Jae-Hak, 한국고분자학회 1998년도 추계 학술대회 , pp.264 - 265, 한국고분자학회, 1998-10 |
| A Study on Photoresist using Concurrent Rqadical and Cationic Polymerization Park, Jong Jin; Kim, Jin-Baek, 한국고분자학회 1995년도 추계 학술대회 , pp.418 - 419, 한국고분자학회, 1995-10-06 |
| Acid Diffusion and Evaporation in Chemically Amplified Resists Kim, Jin-Baek; Kwon, Young-Gil; Choi, Jae-Hak, Advances in Resist Technology and Processing XV, pp.536 - 543, SPIE, 1999-03-15 |
| Acid Diffusion Control in Chemically Amplified Positive Resists Kwon, Young-Gil; Choi, Jae-Hak; Kim, Jin-Baek, 한국고분자학회 1998년도 춘계 학술대회 , pp.36 - 37, 한국고분자학회, 1998-04 |
| Adhesion-promoted copolymers based on copolymers of norbornene derivatives and maleic anhydride for 193-nm photoresist Yun, Hyo-Jin; Kwon, Young-Gil; Lee, Bum Wook; Kim, Jin-Baek, 한국고분자학회 1999 년도 추계 학술대회, pp.234 - 235, 한국고분자학회, 1999-10 |
| Adhesion-promoted copolymers for 193-nm photoresists without cross-linking during lithographic process Yun, Hyo-Jin; Kwon, Young-Gil; Lee, Bum Wook; Kim, Jin-Baek, Journal of Photopolymer Science and Technology, pp.629 - 634, 2000-01 |
| Aryl ether dendron-functionalized aluminum tris(8-hydroxyquinoline)(AlQ3) Park, Ji Young; Kim, Jin-Baek, 한국고분자학회 2004년 추계 학술대회, pp.0 - 0, 한국고분자학회, 2004-10 |
| Bilayer Resists Based on Polyhedral Oligomeric Silsesquioxane for 193-nm Lithography Ganesan, Ramakrishnan; Choi, Jae-Hak; Kim, Kyoung-Seon; Oh, Tae-Hwan; Yun, Hyo-Jin; Kwon, Young-Gil; Kim, Jin-Baek, SPIE-The International Society for Optical Engineering, pp.0, SPIE, 2005-02-27 |
| Bilayer Resists Based on Polyhedral Oligomeric Silsesquioxane for Deep-UV Lithography Ganesan, Ramakrishnan; Kim, Jin-Baek, Korea-Japan Young Scientist Symposium on polymers, 2005, pp.0 - 0, JSPS, KOSEF, 2005-09-30 |
| Chemically Amplified Resist based on the Methacrylate Polymer with 2-Trimethylsilyl-2-propyl Ester Protecting Group Kim, Jin-Baek; Kim, Hyun-Woo, SPIE-The International Society for Optical Engineering, pp.420 - 428, Proceedings of SPIE, 1999-01 |
| Chemically Amplified Resist based on the Norbornene Polymer with 2-Trimethylsilyl-2-propyl Ester Protecting Group Kim, Jin-Baek; Kang, Jae-Sung, 한국고분자학회 1999년 춘계 학술대회 , pp.209 - 209, 한국고분자학회, 1999 |
| Chemically Amplified Resists based on Acrylate Polymers containing Ketal Groups in the Side Chains Kim, Jin-Baek; Park, Jong-Jin; Jang, Ji-Hyun, SPIE-The International Society for Optical Engineering, pp.625 - 632, SPIE, 1999-01 |
| Chemically amplified resists based on methacrylate polymers with cholic acid derivatives Lee, Bum Wook; Yun, Hyo-Jin; Kwon, Young-Gil; Kim, Jin-Baek, 한국고분자학회 2000년 춘계 학술대회, pp.0 - 0, 한국고분자학회, 2000-04 |
| Chemically amplified resists based on norbornene polymer with non- outgassing acid labile protecting group Lee, Jae Jun; Lee, Kwan-Ku; Kim, Jin-Baek, 한국고분자학회 2000년도 추계 학술대회 , v.25, no.2, pp.300 - 300, 한국고분자학회, 2000-10 |
| Chemically Amplified Resists based on Poly(1,4-dioxaspiro[4.4]nonane-2-methyl methacrylate) Kim, Jin-Baek; Park, Jong Jin, 한국고분자학회 1999년도 춘계 학술대회 연구논문초록집, pp.135 - 135, 한국고분자학회, 1999 |
| Chemically amplified resists based on the methacrylate polymers with cholic acid derivatives Kim, Jin-Baek; Lee, Bum Wook; Yun, Hyo-Jin; Kwon, Young-Gil, 한국고분자학회 2000년 춘계 학술대회, pp.42 - 42, 한국고분자학회, 2000 |
| Chemically Amplified Resists based on the Norbornene Copolymers with Steroid Derivatives Kim, Jin-Baek; Lee, Bum-Wook; Kang, Jae-Sung, SPIE-The International Society for Optical Engineering, pp.36 - 43, SPIE, 1999-01 |
| Chemically Amplified Resists based on the Norbornene Copolymers with Steroid Derivatives Kim, Jin-Baek; Lee, Bum Wook, 한국고분자학회 1999년 춘계 학술대회, pp.66 - 66, 한국고분자학회, 1999 |
| Chemically amplified resists based on the norbornene polymer with 2-trimethylsilyl-2-propyl ester protecting group Kim, Jin-Baek; Lee, Jae Jun; Kang, Jae-Sung, Advances in Resist Technology and Processing XVII, pp.1079 - 1087, SPIE, 2000-02-28 |
| Chemically amplified silicon-containing cycloaliphatic photoresists: their synthesis and application to 193-nm lithography Kim, Jin-Baek; Lee, Jae Jun; Lee, Kwan Gu, 한국고분자학회 2000년 춘계학술대회, v.25, no.1, pp.135 - 135, 한국고분자학회, 2000-04 |
| Copolymers of methacrylates with cholic acid derivatives and anhydrides for 193-nm photoresists Ko, Jong Sung; Kim, Kyung Mi; Lee, Kwan Gu; Lee, Bum Wook; Kim, Jin-Baek, 한국고분자학회 2001년 춘계학술대회, pp.156 - 156, 한국고분자학회, 2001-04-01 |
| Diffusion and surface evaporation of photogenerated acid in basic polymers for PED Stability of ArF chemically amplified resists Kwon, Young-Gil; Yun, Hyo-Jin; Lee, Bum Wook; Kim, Jin-Baek, 한국고분자학회 1999 년도 추계 학술대회, pp.250 - 251, 한국고분자학회, 1999-10 |
| Dry-developable Photorersist Kim, Jin-Baek; Kim, Hyun-Woo; Kim, Jae-Young; Choi, Jae-Hak, 한국고분자학회 1997년도 추계 학술대회, pp.153 - 154, 한국고분자학회, 1997-10-11 |
| Dry-Developable Resist Based on Methacrylate Polymer with 2-Trimethylsilyl-2-Propyl Ester Group Kim, Jin-Baek; Kim, Hyun-Woo, Asian Photochemistry Conference, 1999 |
| Dual Patterning of Gold Nanoparticles by Sequential Functionalization of Block Copolymer Thin Films Yoon, Je Moon; Kim, Jin-Baek, 한국고분자학회 2009년도 추계 학술대회 , 한국고분자학회, 2009-04-09 |
| Dual patterning process of block copolymer thin film by combination of top down and bottom-up approaches Ku, Sejin; Kim, Sumin; Kim, Jin-Baek, 한국고분자학회 2008년 춘계 학술대회 , 한국고분자학회, 2008-04-10 |
| Dual Patterning Process of Block Copolymer Thin Films by Combination of Top-Down and Bottom-Up Approaches Ku, Sejin; Kim, Sumin; Kim, Jin-Baek, European Materials Research Society, pp.0 - 0, 2008-05-26 |
| Dual protein patterning using pH-sensitive nonchemically amplified resist Yoon, Je Moon; Kim, Jin-Baek, 한국고분자학회 2009년도 추계 학술대회 , 한국고분자학회, 2009-10-08 |
| Dual responsive materials for sequential patterning by thermal imprint and photolithography Ku, Sejin; Kim, Sumin; Kim, Jin-Baek, 한국고분자학회 2008년 추계 학술대회 , pp.0 - 0, 한국고분자학회, 2008-10-09 |
| Dual responsive photoresists for sequential pattering by thermal imprint and photolithography Bak, Chang Hong; Choi, Soo-Young; Min, Chang Su; Kim, Jin-Baek, 2012 Advanced lithography, SPIE Advanced Lithography, 2012-02-14 |
| Dually Patterned Self-assembled Monolayer via Si-containing Block Copolymer Lithography on Gold Substrate Woo, Seung A; Ku, Sejin; Kim, Sumin; Kim, Jin-Baek, 한국고분자학회 2010년 추계 학술대회, 한국고분자학회, 2010-10-08 |
| Dually Patterned Self-assembled Monolayer via Si-containing Block Copolymer Lithography on Gold Substrate Woo, Seung A; Ku, Sejin; Kim, Sumin; Kim, Jin-Baek, 한국고분자학회 2010년 춘계 학술대회 , 한국고분자학회, 2010-04-08 |
| Dually patterned self-assembled monolayers via silicon-containing block copolymer lithography on gold substrates and their applications Woo, Seung A; Choi, Soo-Young; Bak, Chang Hong; Jo, Gyeong Cheon; Kim, Jin-Baek, Frontiers in Polymer Science 2013, Elsevier, 2013-05-21 |
| Effect of acid structure on deprotection of poly(2-trimethylsilyl-2-propyl methacrylate) Kim, Hyun-Woo; Kim, Jin-Baek, 한국고분자학회 1998년도 추계 학술대회 , pp.80 - 81, 한국고분자학회, 1998-10-16 |
| Effects of florine for photoresists properties Kim, Young Woo; Kwon, Young-Gil; Lee, Jae Jun; Kim, Jin-Baek, 한국고분자학회 2002년 추계학술대회, pp.254 - 254, 한국고분자학회, 2002-10 |
| Electrical Generator Inspired by Lotus-leaf Ha, Jaewook; Kim, Seongmin; Kim, Jin-Baek, Frontier in polymer science, ELSEVIER, 2015-05-20 |
| Encapsulation of Aluminum Hydroxide by Emulsion Polymerization of Methyl Methacrylate Kim, Jin-Baek; Lee, Myung Gu, 한국고분자학회 1994년도 춘계 학술대회 , pp.167 - 168, 한국고분자학회, 1994-04-16 |
| Encapsulation of Elctroluminescent materials using b-cyclodextrin Park, Ji Young; Kim, Jin-Baek, 한국고분자학회 2003년 추계학술대회 , pp.0 - 0, 한국고분자학회, 2003-10 |
| Encapsulation of light emitting materials and photo-patterning using 棺-cyclodextrin Kim, Jin-Baek; Park, Ji Young, Advances in Resist Technology and Processing XXII, v.5753, pp.932 - 938, 2005-02-28 |
| Environmentally stable chemically amplified positive resist containing vinyllactam terpolymers Bok, Cheol Kyu; Koh, Cha-Won; Baik, Ki Ho; Kim, Jin-Baek; Jung, Min Ho; Cheong, Jong-Ho, Advances in Resist Technology and Processing XIV, v.3049, pp.501 - 511, SPIE, 1997-01 |
| Evaluation of Reactivity Ratios of Monomers in the Copolymerization of t-Butyl 3a-Methacryloyloxy-7a-Dihydroxy-5a-Cholan-24-oate and Maleic Anhydride Kim, Jin-Baek; Ko, Jong-Sung; Lee, Bum Wook; Yun, Hyo-Jin, 한국고분자학회 2000년 춘계학술대회 , pp.68 - 68, 한국고분자학회, 2000 |
| Excimer Laser Photoresists Using Alicyclic Matrix Polymers Kim, Jin-Baek; Jung, Min Ho; Kim, Hyun-Woo; Chun, Sung-Deuk, 36th IUPAC International Symposium on Macromolecules, pp.461 - 461, 1996-08-04 |
| Fabrication of dually functionalized patterns on a gold surface via inkless micro-contact printing Shin, Seung Min; Kim, Jin-Baek; Choi, Soo Young, Fourth International Symposium Frontiers in Polymer Science, ELSEVIER SCI LTD, 2015-05-20 |
| Fabrication of Dually Functionalized Surfaces on an Au Substrate Using a Si-Containing Negative Photoresist 최수영; 우승아; 구세진; 하재욱; Kim, Jin-Baek, E-MRS 2014 SPRING MEETING, (E-MRS) European Materials Research Society, 2014-05-26 |
| Fabrication of dually functionalized surfaces on au substrates using si-containing negative photoresists Choi, Soo Young; Woo, Seung-A; Kim, Jin-Baek, Fourth International Symposium Frontiers in Polymer Science, ELSEVIER SCI LTD, 2015-05-20 |
| Fabrication of High Aspect Ratio Nanoporous Structure via a Bilayer Approach Using Silicon-Containing Block Copolymer Kim, Sumin; Ku, Sejin; Kim, Jin-Baek, 한국고분자학회 2010년 춘계 학술대회 , 한국고분자학회, 2010-04-09 |
| Fabrication of High Aspect Ratio Nanoporous Template Using Silicon-Containing Block Copolymer and High Density Au Nanopillar Arrays Ku, Sejin; Park, Changhong; Baek, Younkyung; Jung, Heetae; Kim, Jin-Baek, 한국고분자학회 2010년 추계 학술대회 , 한국고분자학회, 2010-10-07 |
| Fabrication of high performance replica molds for UV curing nanoimprint lithography using diazoketo functionalized POSS hybrid reissts Kim, Jin-Baek; Shin, Seung Min; 우승아, The winter core school of sokendai/asian core program, Institute for Molecular Science (IMS), 2015-01-15 |
| Fabrication of high performance replica molds for UV curing nanoimprint lithography using diazoketo functionalized POSS hybrid resists Shin, Seung Min; 우승아; Kim, Jin-Baek, 차세대 리소그래피학술대회, 한국광학회, 2014-04-10 |
| Fabrication of highly active cone-shaped nanoporous gold SERS substrates via nanosphere lithography Jo, Gyeongcheon; Kim, Jin-Baek, Frontiers in polymer science, ELSEVIER, 2015-05-20 |
| Fabrication of Sub-10 nm TiO2 Nanosheet Arrays via the Spacer-Defined Double-Patterning Process Bak, Chang-Hong; Ku, Se Jin; Jo, Gyeong Cheon; Jung, Kyoung Ok; Kim, Jin-Baek, 2014 춘계 한국고분자학회, 대한 고분자 학회, 2014-04-11 |
| Fabrication of versatile nanoporous templates with high aspect ratios by incorporation of Si-containing block copolymers into the lithographic bilayer system Kim, Su Min; Ku, Se Jin; Jo, Gyeong Cheon; Bak, Chang Hong; Kim, Jin-Baek, Frontiers in Polymer Science 2013, Elsevier, 2013-05-21 |
| Fbrication of Freestanding Titanium Oxide Nanotube Arrays Using Si-Containing Block Copolymer Lithography and Atomic Layer Deposition 조경천; 구세진; 박창홍; 김수민; 신유리; 김광호; 권세훈; et al, E-MRS 2014 SPRING MEETING, (E-MRS) European Materials Research Society, 2014-05-26 |
| High Resolution Bilayer Resists Using Blends of Photoresists and Silicon-Containing Materials Woo, Seung A; Kim, Jin-Baek, 2011 KAIST-Kyoto University Chemistry Symposium, 2011-02-17 |
| High resolution nonchemically amplified resists (Non-CARs) for extreme ultraviolet Woo, Seung A; Choi, Soo-Young; Ku, Se Jin; Kim, Jin-Baek, 2012 Advanced lithography, SPIE Advanced Lithography, 2012-02-14 |
| Hindered amine additives for post-exposure delay stability in ArF chemically amplified resists Kim, Jin-Baek; Kwon, Young-Gil; Yun, Hyo-Jin; Lee, Bum Wook, 한국고분자학회 2000년 춘계학술대회, pp.0 - 0, 한국고분자학회, 2000-04 |
| Improved El efficiency of Cross-Linked Polyfluorene with Cross-Linkable Charge- Transporting Molecules Park, Ji Young; Lee, JH; Ku, Sejin; Kim, Sumin; Shim, HK; Kim, Jin-Baek, Materials Research Society, pp.0 - 0, 2007-11-26 |
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Date issued
- 326 2020 - 2023
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