Adhesion-promoted copolymers based on copolymers of norbornene derivatives and maleic anhydride for 193-nm photoresist
- Publisher
- 한국고분자학회
- Issue Date
- 1999-10
- Language
- ENG
- Citation
한국고분자학회 1999 년도 추계 학술대회, pp.234 - 235
- Appears in Collection
- CH-Conference Papers(학술회의논문)
- Files in This Item
- There are no files associated with this item.
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