DSpace at KOASAS: Bilayer Resists Based on Polyhedral Oligomeric Silsesquioxane for Deep-UV Lithography

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College of Natural Sciences(자연과학대학)Dept. of Chemistry(화학과)CH-Conference Papers(학술회의논문)

Bilayer Resists Based on Polyhedral Oligomeric Silsesquioxane for Deep-UV Lithography

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Ganesan, Ramakrishnan / Kim, Jin-Baek researcher

Publisher: JSPS, KOSEF

Issue Date: 2005-09-30

Language: ENG

Citation: Korea-Japan Young Scientist Symposium on polymers, 2005, pp.0 - 0

URI: http://hdl.handle.net/10203/139213

Appears in Collection: CH-Conference Papers(학술회의논문)

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