Dual responsive materials for sequential patterning by thermal imprint and photolithography
- Publisher
- 한국고분자학회
- Issue Date
- 2008-10-09
- Language
- ENG
- Citation
한국고분자학회 2008년 추계 학술대회 , pp.0 - 0
- Appears in Collection
- CH-Conference Papers(학술회의논문)
- Files in This Item
- There are no files associated with this item.
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.