Browse "EE-Conference Papers(학술회의논문)" by Author 1380
Showing results 141 to 200 of 214
| N-doped graphene aerogel loudspeaker Kim, Choong Sun; Lee, Kyung Eun; Kim, Sang Ouk; Choi, Jung Woo; Cho, Byung Jin, The 8th International Conference on Recent Progress in Graphene/2D Research, SKKU Advanced Institute of Nano Technology, 2016-09-27 |
| New breakdown mechanism of ultra thin gate oxides under ballistic transport Cho, Byung Jin; Lee, SH; Joo, MS; Park, YJ; Kim, JC, 1st Korean Semiconductor Tech. Symp., pp.0 - 0, 1994-02-15 |
| New reliability issues of CMOS transistors with 1.3 nm gate oxide Cho, Byung Jin; Li, MF; Chen, G; Loh, WY; Kwong, DL, 7th International Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films, pp.0 - 0, 2003-04-28 |
| New Substrate Platform for Metal-Gate/High-k Gate Dielectric MOSFET Integration and RF Technology up to 100 GHz Cho, Byung Jin; Chin, A; Mei, P; Zhu, C; Li, MF; Lee, S; Yoo, WJ, Advanced Crystal Growth Conference and 2003 International Symposium on Substrate Engineering, pp.0 - 0, 2003-11-13 |
| Niobium oxide (Nb2O5) as a high-K dielectric for RF IC application Cho, Byung Jin; Kim, SJ; Li, MF; Zhu, C; Chin, A; Yu, MB; Xiong, YZ, 3rd International Conference on Materials for Advanced Technologies, pp.10 - 10, 2005-07-03 |
| Non-volatile Flexible ReRAM based on graphene oxide 조병진, IEEK Summer Conference 2010, IEEK Summer Conference 2010, 2010-06-16 |
| Non-Volatile Memory Using Graphene Oxide for Flexible Electronics Cho, Byung Jin, 10th International Conference on Nanotechnology (IEEE NANO 2010), IEEE, 2010-08-18 |
| Novel oxynitridation technology for highly reliable thin dielectrics Cho, Byung Jin; Joo, MS; Lee, SH; Lee, SK; KIm, JC; Choi, SH, Symp. on VLSI Tech., pp.107 - 107, 1995-06-07 |
| Novel ZrO2/Si3N4 Dual Charge Storage Layer to Form Step-Up Potential Wells for Highly Reliable Multi-Level Cell Application Cho, Byung Jin; Zhang, G; Hwang, WS; Bobade, SM; Lee, SH; Yoo, WJ, International Electron Device Meeting (IEDM) 2007, pp.0 - 0, 2007-12-01 |
| Optimization of Annealing Process of Screen Printed Sb2Te3 and Bi2Te3 Thick Films for Power Generator Kim, Sun Jin; We, Ju Hyung; Kim, Gyung Soo; Cho, Byung Jin, The 31st International & 10th European Conference on Thermoelectrics, ICT/ECT2012, Int'l Thermoelectrics Society, 2012-07-09 |
| Organic/inorganic hybrid gate dielectric for high-performance and low-power organic thin-film transistors Shin, W.C.; Moon, H.; Yoo, S.; Cho, Byung Jin, 2010 10th IEEE Conference on Nanotechnology, NANO 2010, pp.936 - 939, IEEE, 2010-08-17 |
| p+ n shallow junction formation from BN source using RTP 조병진; Kim, KT; Kim, CK, Conf. on CAD, Semiconductor Material and Components, pp.77 - 77, 1987-05-12 |
| Pentacene Thin-Film Transistors with PVP/HfLaO Hybrid Gate Dielectric for Low Voltage Operation Cho, Byung Jin, 2010 Material Research Society Spring Meeting, 2010 Material Research Society Spring Meeting, 2010-04-08 |
| Photoluminescene from silicon nanocrystals formed by pulsed laser deposition Cho, Byung Jin; Chen, XY; Lu, YF; Wu, YH; Song, WD; Hu, H, MRS Symposium, pp.13 - 13, 2003-04-22 |
| Physical and electrical properties of MOCVD HfAlxOy gate dielectric and their composition ratio dependence Cho, Byung Jin; Joo, MS; Yeo, CC; Ching, YL; Loh, WY; Whoang, SJ; Mathew, S, International Conference on Materials for Advanced Technologies, pp.517 - 517, 2003-12-11 |
| Predicting plasma charging damage in ultra thin gate oxide by using nondestructive DCIV technique Cho, Byung Jin; Guan, H; Li, MF; Zhang, Y; Jie, BB; Xie, J; Wang, JLF, 1999 IEEE International Integrated Reliability Workshop (IRW) Final Report, pp.20 - 20, 1999-10-15 |
| Process and Structural Optimization of a Planar-Type Thermoelectric Power Generator by Screen-Printing Technique We, Ju Hyung; Kim, Sun Jin; Kim, Gyung Soo; Cho, Byung Jin, The 31st International & 10th European Conference on Thermoelectrics, Int'l Thermoelectrics Society, 2012-07-09 |
| Process Control and Uniformity Improvement in Synthesis of Large-scale Graphene Layers on Metal Thin Films. Cho, Byung Jin, 2010 Material Research Society Spring Meeting, 2010 Material Research Society Spring Meeting, 2010-04-09 |
| Process optimization for multiple-pulse laser annealing of boron implanted silicon with germanium pre-amorphization Cho, Byung Jin; Poon, D; Lu, YF; Bhat, M; See, A, MRS Spring Meeting, pp.0 - 0, 2003-04-22 |
| Process Optimization of Screen-printed Thermoelectric Thick-films for Flexible Thermoelectric Devices Choi, Hyeongdo; Kim, Sun Jin; Kim, Yongjun; We, Ju Hyung; Shin, Ji Seon; Yi, Kevin K; Cho, Byung-Jin, The 4th International Conference on Electronic Materials and Nanotechnology for Green Environment, The Korean Institute of Metals and Materials, 2016-11-07 |
| Progressive breakdown statistics in ultra-thin silicon dioxides Cho, Byung Jin; Loh, WY; Li, MF; Chan, DSH; Ang, CH; Zhen, ZJ; Kwong, DL, 10th International Symp. on the Physical and Failure Analysis of Integrated Circuits (IPFA), pp.157 - 157, 2003-07-08 |
| Properties of graphene on different dielectrics and graphene oxide based flexible resistive memory Cho, Byung Jin, Recent Advances in Graphene and Related Materials 2010, Engineering Conferences International, Recent Advances in Graphene and Related Materials 2010, 2010-08-04 |
| Properties of PVD Hafnium oxide films in metal-insulator-metal structure and the role of HfN barrier at dielectric/metal interface Cho, Byung Jin; Kim, SJ; Lim, HF; Hu, H; Yu, XF; Yu, HY; Li, MF, 2nd International Conference on Materials for Advanced Technologies, pp.513 - 513, 2003-12-11 |
| PVP/GO:Graphene/Polymer composite film as a Cu diffusion barrier 김재환; 윤성준; 봉재훈; 윤알렉산더; 조병진, The 3rd Korean Graphene Symposium, 한국그래핀연구회, 2016-04-14 |
| PVP/GO:Graphene/polymer composite film as a Cu diffusion barrier Kim, Jae Hwan; Yoon, Seong Jun; Bong, Jae Hoon; Yoon, Alexander; Cho, Byung Jin, The 8th International Conference on Recent Progress in Graphene/2D Research, SKKU Advanced Institute of Nano Technology, 2016-09-27 |
| Quasi-breakdown of ultra thin gate oxide under high field stress Cho, Byung Jin; Lee, SH; Kim, JC; Choi, SH, IEEE International Electron Devices Meeting (IEDM), pp.605 - 605, 1994-12-11 |
| Radiation -induced leakage current of ultra-thin gate oxide under X-ray lithography condictions Cho, Byung Jin; Kim, SJ; Ling, CH; Joo, MS; Yeo, IS, Proc. of the 7th International Symp. on the Physical and Failure Analysis of Integrated Circuits (I, pp.30 - 30, 1999-07-05 |
| Rare earth oxide (Gd2O3) s a blocking layer in SONOS-type nonvolatile memory devices for high speed operation 조병진; Pu, J; Kim, SJ; Kim, YS, 한국반도체 학술대회, pp.615 - 616, 2008 |
| Realization of a Wearable Thermoelectric Power Generator by Screen-Printing Technique for Human Body Applications We, Ju Hyung; Kim, Sun Jin; Kim, Gyung Soo; Cho, Byung Jin, 2nd ENGE 2012 (Int'l Conference on Electrical Materials and Nanotechnology for Green Environment), The korean Institute of Metals and Materials, 2012-09-19 |
| Recent progress and technical issues of the application of graphene to electronic devices Cho, Byung Jin, SEMI Technology Symposium 2013, SEMI Korea, 2013-01 |
| Recent progress of graphene based FET device technology 조병진, 한국공업화학회 2012 추계학술대회, 한국공업화학회, 2012-11 |
| Recent progress on application of graphene to MOS devices 조병진, Nano Korea 2012 (The 10th Int'l Nanotech Symposium & Nano-Convergence Expo in Korea, Ministry of Knowledge Economy, 2012-08 |
| Role of Si in Fermil-level pinning phenomena in metal/high-K dielectric gate stack Cho, Byung Jin; Joo, MS; Balasubramanian, N; Kwong, DL, International Conference on Materials for Advanced Technologies, pp.40 - 40, 2005-07-03 |
| Roles of primary hothole and FN electron fluences in gate oxide breakdown Cho, Byung Jin; Li, MF; He, YD; Ma, SG; Lo, KF; Xu, MZ, Materials Research Society (MRS) 1999 Fall Meeting Symp. Proc, pp.0 - 0, 1999-11-29 |
| Schottky-Barrier Si nanowire MOSFET: effects of Source/Drain metals and gate dielectrics Cho, Byung Jin; Yang, WF; Whang, SJ; Lee, SJ; Zhu, HC; Gu, HL, 2007 MRS Spring Meeting, pp.0 - 0, 2007-04-09 |
| Seeding ALD of high-k gate dielectric in CVD graphene FETs for enhanced device performance and reliability Shin, Woo Cheol; Cho, Byung Jin, Graphene Week 2012, 2012-06 |
| Sidewall-sealed double LOCOS isolation structure with defect-free isolation recess Cho, Byung Jin; Kim, YB; Jang, SA; Kim, JC, 43rd Spring Meeting of the Japan Society of Applied Physics and Related Societies, pp.730 - 730, 1996-03-28 |
| Silicon nanostructured films formed by pulsed-laser deposition in inert gas and reactive gas Cho, Byung Jin; Chen, XY; Lu, YF; Wu, YH; Hu, H, MRS Symposium, pp.19 - 19, 2003-04-21 |
| Simultaneous measurements of Seebeck coefficient and thermal conductivity across thermoelectric film Kim, Sun Jin; We, Ju Hyung; Kim, Gyung Soo; Cho, Byung Jin, The 32nd International Conference on Thermoelectrics, Thermoelectrics Society, 2013-07-01 |
| SONOS type memory cell with ALD LaAlO blocking oxide for high speed operation He, W.; Chan, D.S.H.; Cho, Byung Jin, 2008 9th International Conference on Solid-State and Integrated-Circuit Technology, ICSICT 2008, pp.835 - 838, 2008-10-20 |
| Stability Enhancement of Graphene Field Effect Transistors By Employing Ultrathin Amorphous Fluoropolymer Interface Layer Shin, Woo Cheol; Cho, Byung Jin, Nature conference - Graphene : The Road to Applications, Nature Publishing Group, 2011-05 |
| Strain Analysis of a Single-crystalline Silicon Membrane using FEM Simulation Kim, Choelgyu; Bong, JH; Hwang, WS; Cho, Byung Jin; Kim, Taek Soo, MPC 2016 Autumn Symposium, MPC, 2016-09-23 |
| Study of pure Ge on Si substrate for nMOSFET with HfAlO as gate dielectric and its thermal stability Cho, Byung Jin; Yeo, CC; Yeo, H; Gao, F; Lee, SJ; Yu, CY; Liu, CW, International Conference on Materials for Advanced Technologies, pp.13 - 13, 2005-07-03 |
| Study of PVD HfO2 and HfOxNy as dielectrics for MIM capacitor application Cho, Byung Jin; Lim, HF; Kim, SJ; Hu, H; Yu, XF; Yu, HY; Li, MF, International Conference on Materials for Advanced Technologies, pp.532 - 532, 2003-12-11 |
| Study on nonvolatile byproducts generated during etching of advanced gate stacks Cho, Byung Jin; Hwang, WS; Chan, DSH; Yoo, WJ, 28th International Symposium on Dry Process, pp.0 - 0, 2006-11-29 |
| Substituted Aluminum Metal Gate on high-K Dielectric for low work-function and Fermi-Level Pinning Free Cho, Byung Jin; Park, CS; Tang, LJ; Kwong, DL, International Electron Device Meeting (IEDM), pp.0 - 0, 2004-12-13 |
| Substrate dependence of growth of single crystalline Si1-xGex nanowires and performance of MOSFET Cho, Byung Jin; Whang, SJ; Lee, SJ; Yang, WF; Zhu, HC; Liew, YF, 211th Electrochemical Society Meeting, pp.0 - 0, 2007-05-06 |
| Surface passivation using silane for epitaxial growth of graphene on SiC substrate Kang, B.-J.; Lim, S.-K.; Cho, Byung Jin, 1st International Symposium on Emerging Materials for Post-CMOS Applications - 215th Meeting of the Electrochemical Society, v.19, pp.125 - 130, 2009-05-25 |
| Surface Pre-Treatment for Epitaxial Growth of Graphene on SiC Substrate 조병진; Seo, JH; Kang, BJ, 16th Korean Conference on Semiconductors, 2009-02-20 |
| Synthesis and transistor performances of high quality single crystalline vapor-liquid-solid grown Si1-xGex nanowire Cho, Byung Jin; Whang, SJ; Lee, SJ; Yang, WF; Liew, YF; Kwong, DL, IEEE-Nanotech 2007, pp.0 - 0, 2007-08-02 |
| Synthesis of large-scale graphene layers on metal thin films and application to electronic devices Cho, Byung Jin; Mun, Jeong Hun; Song, Seung Min; Noh, Young Dal; Kang, Byung Jin, International Conference on Electronic Materials 2010, International Union of Materials Research Societies, 2010-08 |
| Synthesis of wafer scale graphene layer for future electronic devices Cho, Byung Jin, 2010 Asia-Pacific Workshop on Fundamentals and Applications of Advanced Semiconductor Devices, pp.65 - 67, IEICE, 2010-07-01 |
| Technical challenges in Front-End Processes for next generation CMOS devices Cho, Byung Jin, AMSEA ET (Applied Materials South East Asia Engineering & Technology) Conference 2005, pp.0 - 0, 2005-08-07 |
| Technical Issues and Recent Progress on Graphene-based RF MOSFET Cho, Byung Jin, IEEE Topical Symposium on RF Nanotechnology, IEEE, 2012-05 |
| The effect of Ge composition and Si cap thickness on hot carrier reliability of Si/Si1-xGex/Si p-MOSFETs with high-K/metal gate Cho, Byung Jin; Loh, WY; Majhi, P; Lee, SH; Oh, JW; Sassman, B; Young, C; et al, 2008 Symposium on VLSI Technology, pp.56 - 57, 2008-06-17 |
| The effect of Interfacial Layer of High-K Dielectrics on GaAs Substrate Cho, Byung Jin; Tong, Y; Dalapati, GK; Oh, HJ, 211th Electrochemical Society Meeting, pp.0 - 0, 2007-05-06 |
| The effect of nitrogen incorporation into the gate oxide by using shallow implantation of nitrogen and drive-in process Cho, Byung Jin; Ko, LH; Nga, YA; Chan, LH, Proc. of 1998 IEEE Hong Kong Electron Devices Meeting, pp.32 - 32, 1998-08-29 |
| The effects of Ge composition and Si cap thickness on hot carrier reliability of Si/Sil-xGex/Si p-MOSFETs with high-K/metal gate Loh, W.-Y.; Majhi, P.; Lee, S.-H.; Oh, J.-W.; Sassman, B.; Young, C.; Bersuker, G.; et al, 2008 Symposium on VLSI Technology Digest of Technical Papers, VLSIT, pp.56 - 57, 2008-06-17 |
| Thermoelectric Properties of p-type Sb2Te3 and n-type Bi2Te3 Thick Films Deposited by Screen-Printing Technique Kim, Sun Jin; We, Ju Hyung; Kim, Gyung Soo; Cho, Byung Jin, 2nd ENGE 2012 (Int'l Conference on Electrical Materials and Nanotechnology for Green Environment), The korean Institute of Metals and Materials, 2012-09-19 |
| Thin Film Thermoelectric Module using Screen Print Method Cho, Byung Jin; Choi, Kyung Cheol, 29th International Conference on Thermoelectrics, 29th International Conference on Thermoelectrics, 2010-05-31 |
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Type
- 107 Article
- 8 Book
- 22,776 Conference
Date issued
- 2,090 2020 - 2024
- 8,145 2010 - 2019
- 7,999 2000 - 2009
- 3,741 1990 - 1999
- 870 1980 - 1989