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Showing results 65901 to 65920 of 109473

65901
Plasma-Assisted Etching 에서 식각 패턴 형성에 관한 연구

장충석, Bull. Kor. Phy. Soc., pp.204 - 204, 1995

65902
Plasma-Assisted Etching에서 식각패턴 형성에 관한 연구

최덕인, 한국물리학회, pp.196 -, 1995

65903
Plasma-assisted formation of metallic nickel domains on nickel-iron-molybdenum oxyhydroxide for efficient, electrocatalytic oxygen-evolution reaction

Moon, Byeong Cheul; Kang, Jeung Ku, 2019 ACS National Meeting & Exposition, American Chemical Society, 2019-04-02

65904
Plasma-Assisted Multi-Metallic Oxyhydroxides for Efficient Electrocatalytic Oxygen Evolution Reaction

Moon, Byeong Cheul; Kang, Jeung Ku, 2018 IUMRS-ICEM, The Materials Research Society of Korea, Internatinal Union of Materials Research Societies, 2018-08-21

65905
Plasma-assisted selective catalytic reduction of NOx over Ag/γ-Al2O3 with dodecane as reducing agent at low temperature

Nguyen, Duc Ba; Matyakubov, Nosir; Saud, Shirjana; 목영선; 이수민; 명재욱, 한국화학공학회 2021년도 봄 총회 및 학술대회, 한국화학공학회, 2021-04-23

65906
Plasma-Electron Coirradiation induced Fabrication of Hexagonal Non-Close-Packed Colloidal crystal monolayer

김재준; 조성오, 한국원자력학회 춘계학술대회, 한국원자력학회, 2011-05-25

65907
Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4, SiH4, and N2/H2/Ar Plasma

KANG SANG WON, Atomic Layer Deposition (ALD) 2002, 2002-01-01

65908
Plasma-Enhanced Atomic Layer Deposition of Aluminum Grown by a Sequential Supply of TMA and H2

Kang, Sang-Won, 3rd International AVS Conference on Microelectronics and Interfaces, ICMI, 2002-02

65909
Plasma-enhanced atomic layer deposition of HfO2 thin films using oxygen plasma

Park, P.K.; Kang, Sungwon, 208th Meeting of The Electrochemical Society, pp.915 -, 2005-10-16

65910
Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for the Application of Cu Diffusion Barrier

KANG SANG WON, AVS 6th International Conference on Atomic Layer Deposition, pp.0 - 0, 2004-08-01

65911
Plasma-enhanced atomic layer deposition of Ta(C)N thin films for copper diffusion barrier

Kim K.H.; Seong-Jun Jeong; Yoon J.S.; Kim Y.M.; Kwon S.H., 5th Symposium on Atomic Layer Deposition - 216th Meeting of the Electrochemical Society, v.25, pp.301 - 308, 2009-10-05

65912
Plasma-Enhanced Atomic Layer Deposition of TiAlN

KANG SANG WON, 4th International AVS Conference on Microelectronics and Interfaces, pp.0 - 0, 2003-01-01

65913
Plasma-enhanced atomic layer deposition of TiN thin film using TiCl4 and N2/H2/Ar radicals

KANG SANG WON, Atomic layer Deposition (ALD) 2002, 2002-01-01

65914
Plasma-Enhanced Atomic Layer Deposition of Uniform Hexagonal Boron Nitride Films

Park, Hamin; Kim, Tae Keun; Cho, Sung Woo; Jang, Hong Seok; Lee, Sang Ick; Choi, Sung-Yool, MRS SPRING MEETING 2017, MRS SPRING MEETING 2017, 2017-04-20

65915
Plasma-Enhanced Atomic Layer Depposition of HfO2 Thin Films Using Oxygen Plasma

Sang-Won Kang, 208th Meeting of The Electrochemical Society, 2005

65916
Plasma-etched Nanofiber Anisotropic Conductive Films (ACFs) for Ultra Fine Pitch Interconnection

Lee, Sang Hoon; Kim, Tae Wan; Paik, Kyung-Wook, 65th Electronic Components and Technology Conference, IEEE Electronic Components and Technology Conference, 2015-05-27

65917
Plasma-Etching induced Damage to Thin Oxide

Hyung-Cheol Shin, IEEE/SEMI Advanced Semiconductor Manufacturing Conference, pp.79 - 83, 1992

65918
Plasma-functionalized solution and its applications

Park, Sanghoo; Choe, Wonho, 2nd Asia-Pacific Conference on Plasma Physics (AAPPS-DPP 2018), Division of Plasma physics, Association of Asia-PacificPhysical Societies, 2018-11-13

65919
Plasma-Functionalized Solution and Its Applications for Plasma Farming

Choe, Wonho; Park, Sanghoo, The 7th International Conference on Microelectronics and Plasma Technology, Songdo Convensia, 2018-07-24

65920
Plasma-functionalized solution: A potent antimicrobial agent for biomedical applications from antibacterial therapeutics to biomaterial surface engineering

Park, Joo Young; Choe, Wonho, The 71st Annual Gaseous Electronics Conference, American Physical Society, 2018-11-05

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