DSpace at KOASAS: Plasma-Enhanced Atomic Layer Deposition of Aluminum Grown by a Sequential Supply of TMA and H2

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College of Engineering(공과대학)Dept. of Materials Science and Engineering(신소재공학과)MS-Conference Papers(학술회의논문)

Plasma-Enhanced Atomic Layer Deposition of Aluminum Grown by a Sequential Supply of TMA and H2

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Kang, Sang-Won researcher

Publisher: ICMI

Issue Date: 2002-02

Language: English

Citation: 3rd International AVS Conference on Microelectronics and Interfaces

URI: http://hdl.handle.net/10203/131039

Appears in Collection: MS-Conference Papers(학술회의논문)

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