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College of Engineering(공과대학)Dept. of Materials Science and Engineering(신소재공학과)MS-Conference Papers(학술회의논문)

Plasma-Enhanced Atomic Layer Depposition of HfO2 Thin Films Using Oxygen Plasma

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Sang-Won Kangresearcher
Issue Date
2005
Language
ENG
Citation

208th Meeting of The Electrochemical Society

URI
http://hdl.handle.net/10203/144246
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MS-Conference Papers(학술회의논문)
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