Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4, SiH4, and N2/H2/Ar Plasma
- Issue Date
- 2002-01-01
- Language
- ENG
- Citation
Atomic Layer Deposition (ALD) 2002
- Appears in Collection
- MS-Conference Papers(학술회의논문)
- Files in This Item
- There are no files associated with this item.
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