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College of Engineering(공과대학)School of Computing(전산학부)CS-Conference Papers(학술회의논문)

Plasma-enhanced atomic layer deposition of HfO2 thin films using oxygen plasma

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Park, P.K. / Kang, Sungwonresearcher
Issue Date
2005-10-16
Language
ENG
Citation

208th Meeting of The Electrochemical Society, pp.915 -

ISSN
1091-8213
URI
http://hdl.handle.net/10203/146045
Appears in Collection
CS-Conference Papers(학술회의논문)
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