Showing results 25 to 67 of 67
Mach probe in electron cyclotron resonance plasma Chang, Hong-Young; Lee, PW, 2nd APCPST, APCPST, 1995 |
Mach probe measurement of flow velocity in RF plasma Yang Jang Gyoo; Chang, Hong-Young, The IEEE International Conference on Plasma Science, pp.179 -, IEEE, 1994-06-06 |
Measurement of Ion Energy Distribution in Dual Frequency Capacitively Coupled Plasma Chang, Hong-Young; Seo, SH; Lee, HS; Lee, JB, AVS 54th International Symposium & Exhibition, AVS, 2007 |
New Plasma Source Development Using a Parallel Resonance Antenna for Dry Etching Kwon, G.-C.; Kim, H.-S.; Kim, J.-S.; Choi, S.-H.; Jun, J.-H.; Lee, D.S.; Lee, Y.K.; et al, 2003 IEEE International Conference on Plasma Science, pp.403 -, IEEE, 2003-06-02 |
Nonlocal Electron Kinetics in a Planar Inductive Discharge Chang, Hong-Young, 17th Symposium on plasma processing(SPP17), 2000 |
On the Inductively Coupled Plasma for the Next - Generation Processing. Chang, Hong-Young, International Workshop of Particle Beams & Plasma Interaction on Materials, Particle Beams & Plasma Interaction on Materials, 2002 |
On the Inductively Coupled Plasma for the Next - Generation Processing. Chang, Hong-Young, Frontiers of Surface Engineering 2001 (FSE 2001) Conference and Exhibition, Frontiers of Surface Engineering, 2001 |
On the Inductively Coupled Plasma for the Next - Generation Processing. Chang, Hong-Young, The Twelfth Gaseous Electronics Meeting , 2002 |
Performance Characteristics of Inductively Coupled rf Ion Source for Low-energy Neutral Beam Chang, Hong-Young; Park, M., AVS 54th International Symposium & Exhibition, AVS, 2007 |
Plasma Characterization of 2, 27 MHz Dual Frequency Capacitively Coupled Plasma(CCP) Chang, Hong-Young; Jeon, B, 6th APCPST, APCPST, 2002-07 |
Plasma parameter control studies for next generation plasma processing 장홍영, 한국물리학회 학술대회, 한국물리학회, 2003 |
Plasma parameter control studies in next generation processing 장홍영, SEMICON KOREA 2003, SEMICON, 2003-01 |
Plasmas Generated by Axisymmetric Helicon Antenna Uhm, HS; Uhm, SH; Chang, Hong-Young, 43rd Annual Meeting of the APS Division of Plasma Physics , APS, 2001 |
power dissipation mode transition by a magnetic field 유신재; 정진욱; 배근희; 장홍영, 한국진공학회 2002년도 제23회 학술발표회, 한국진공학회, 2002 |
Power Dissipation Mode Transition Induced by a Driving Frequency Increase in Capacitively Coupled Plasma You, S.J.; Kim, H.C.; Chang, Hong-Young; Lee, J.K., 2003 IEEE International Conference on Plasma Science, pp.352 -, IEEE, 2003-06-02 |
Pressure limitation of electron density measurement using a wave-cutoff method in weakly ionized plasmas Na, BK,; Lee, YS; Jun, HS; Chang, Hong-Young, 2009 IEEE International Conference on Plasma Science - Abstracts, ICOPS 2009, IEEE, 2009-06-01 |
Production of high density plasma on the substrate in a helicon source and application to the deposition of SiOF film with low dielectric constant Kim, JH; Seo, SH; Yun, SM; Chang, Hong-Young, The Electrochemical society meeting, The Electrochemical society, 1995 |
Properties of plasma generated by a sheat-helix antenna Chang, Hong-Young, 28th IEEE International Conference on Plasma Science(ICOPS) and 13th IEEE International Pulsed Power Conference (PPC), IEEE, 2001-06-17 |
Properties of Plasmas generated by a Sheath-Helix Antenna Uhm, HS; Uhm, SH; Chang, Hong-Young, IEEE PPPS 2002, IEEE, 2002 |
Properties of plasmas generated by a single-turn antenna at lower-hybrid frequency Uhm, S.; Uhm, H.S.; Chang, Hong-Young, 2002 29th IEEE International Conference on plasma Science, pp.223 -, IEEE, 2002-05-26 |
Real Time Intrusive Optical emission spectroscopy for process control Lee, PW; Kim, YJ; Seo, SH; Kim, JH; Chang, Hong-Young, , 1995 |
Review of heating mechanism research in inductively coupled plasma Chang, Hong-Young, The 2nd Asian-European International Conference on Plasma Surface Engineering, 1999 |
Spark gap produced plasma diagnostics Chang, Hong-Young, 1990 IEEE International Conference on Plasma Science, pp.100 -, IEEE, 1990-05-21 |
Status and characteristics of diagnostics on Korea Superconducting Tokamak Research(KSTAR) Chang, Hong-Young, , 1996 |
Study of Helicon Wave Plasma Production and Its Characteristics Kim, JH; Seo, SH; Kim, YJ; Lee, PW; Chang, Hong-Young, 2nd APCPST, APCPST, 1994 |
The deposition of SiOF film with low dielectric constant in a helicon plasma source Kim, JH; Seo, SH; Yun, SM; Lee, KM; Choi, CK; Chang, Hong-Young, 3rd Asia-Pacific Conference on Plasma Science & Technology, Plasma Science & Technology, 1996 |
The Effect of pressure and gas species on Electron Cyclotron Resonance (ECR) in a weakly magnetized Inductively Coupled Plasma(ICP) Chung, W; Kim, SS; Lee, SW; You, SJ; Chang, Hong-Young, 54th Annual Gaseous Electronics Conference, 2001-10 |
The Effects of Electrostatic Bias on the Radial Plasma Potential Profile in a Helicon Plasma Lee, SW; Chang, Hong-Young, AVS 47th International Symposium, AVS, 2000 |
The electron cyclotron resonance in a weakly magnetized radio frequency inductive discharge Chung, C; Chang, Hong-Young, 53rd ANNUAL GASEOUS ELECTRONICS CONFERENCE, APS Physics, 2000-10 |
Theoretical investigation of the evolution of electron energy distribution functions in inductively coupled discharges Kim, S.S.; Chung, C.W.; Chang, Hong-Young, The Joint International Plasma Symposium, v.435, no.40545, pp.72 - 77, Thin Solid Films, 2002-07-01 |
Wave profile changes at lower hybrid resonance in Helicon plasma 엄세훈; 엄한섭; 장홍영, KAPRA & KPS/DPP Workshop 2000, KAPRA & KPS/DPP, 2000 |
고밀도 Helicon Plasma를 이용한 저유전율의 SiOF박막 증착 연구 김정형; 서상훈; 윤석민; 장홍영, 한국진공학회 제9회 학술발표회, 한국진공학회, 1995 |
고출력 펄스레이져에 의해서 생성되는 고온의 플라즈마 온도 측정 장홍영, 한국물리학회 학술발표회, 한국물리학회, 1988 |
그리드를 이용한 플라즈마 변수 제어에 따른 Ar/CF4 플라즈마에서 중성종 및 이온들의 분포변화 홍정인; 배근희; 서상훈; 장홍영, 한국진공학회 제17회 학술발표회, 한국진공학회, 1999 |
그리드를 장착한 DC 마그네트론 플라즈마의 플라즈마 특성 연구 인정환; 정민재; 한전건; 장홍영, 한국표면공학회 2003년도 춘계학술발표회, 한국표면공학회, 2003 |
두 개의 그리드를 이용한 개선된 마그네트론 플라즈마에서 플라즈마 특성 측정 인정환; 인정환; 장홍영, 한국진공학회 2003년도 제24회 학술발표회 , 한국진공학회, 2003 |
유도결합 플라즈마에서 E-H 모드 전이 및 전자에너지 분포함수의 주파수 특성 연구 서상훈; 홍정인; 배근희; 장홍영, 한국진공학회 제15회 학술발표회, 한국진공학회, 1998 |
유도결합 플라즈마에서 그리드 전압에 의한 플라즈마 제어에 관한 연구 홍정인; 서상훈; 배근희; 장홍영; 윤남식, 한국진공학회 제16회 학술발표회, 한국진공학회, 1999 |
유도결합 플라즈마에서의 전자에너지 분포 특성 및 Ramsauer 효과에 대한 연구 서상훈; 김성식; 홍정인; 배근희; 장충석; 장홍영, 한국진공학회 제16회 학술발표회, 한국진공학회, 1999 |
차세대 식각 공정을 위한 플라즈마 변수 제어에 관한 연구 장홍영, 제10회 한국반도체학술대회, 2003 |
축전 차폐막이 없는 유도결합 아르곤 플라즈마에서 전자에너지 분포 및 플라즈마 전위에 대한 연구 서상훈; 홍정인; 장홍영, 한국진공학회 1999년도 제17회 학술발표회 , 한국진공학회, 1999 |
헬리콘 플라즈마에서 이온 에너지 분포 및 플라즈마 전위에 관한 연구 김정형; 서상훈; 장홍영, 한국진공학회 학술발표회, 한국진공학회, 1995 |
헬리콘 플라즈마의 전기적 특성 윤석민; 서상훈; 김정형; 장홍영, 한국진공학회 제10회 학술발표회, 한국진공학회, 1996-03 |
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