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Browse "Dept. of Chemistry(화학과)" by Author Choi, Jae-Hak

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Showing results 1 to 19 of 19

1	A PED-stabilized Chemically Amplified Resist Kim, Jin-Baek; Choi, Jae-Hak; Jung, Min Ho; Kim, Hyun-Woo, 한국고분자학회 1997년도 추계 학술대회 , pp.329 - 330, 한국고분자학회, 1997-10-11
2	A study on evaporation of photogenerated acid and base additives in chemically amplified positive resists Kim, Jin-Baek; Kwon, Young-Gil; Choi, Jae-Hak, 한국고분자학회 1998년도 추계 학술대회 , pp.264 - 265, 한국고분자학회, 1998-10
3	Acid Diffusion and Evaporation in Chemically Amplified Resists Kim, Jin-Baek; Kwon, Young-Gil; Choi, Jae-Hak, Advances in Resist Technology and Processing XV, pp.536 - 543, SPIE, 1999-03-15
4	Acid Diffusion Control in Chemically Amplified Positive Resists Kwon, Young-Gil; Choi, Jae-Hak; Kim, Jin-Baek, 한국고분자학회 1998년도 춘계 학술대회 , pp.36 - 37, 한국고분자학회, 1998-04
5	Bilayer Resists Based on Polyhedral Oligomeric Silsesquioxane for 193-nm Lithography Ganesan, Ramakrishnan; Choi, Jae-Hak; Kim, Kyoung-Seon; Oh, Tae-Hwan; Yun, Hyo-Jin; Kwon, Young-Gil; Kim, Jin-Baek, SPIE-The International Society for Optical Engineering, pp.0, SPIE, 2005-02-27
6	Dry-developable Photorersist Kim, Jin-Baek; Kim, Hyun-Woo; Kim, Jae-Young; Choi, Jae-Hak, 한국고분자학회 1997년도 추계 학술대회, pp.153 - 154, 한국고분자학회, 1997-10-11
7	High performance molecular resists based on beta-cyclodextrin Kwon, Younggil; Yun, Hyojin; Ganesan, Ramakrishnan; Kim, Jin-Baek; Choi, Jae-Hak, POLYMER JOURNAL, v.38, no.9, pp.996 - 998, 2006
8	Local pH-Responsive Diazoketo-Functionalized Photoresist for Multicomponent Protein Patterning Yun, Je Moon; Ganesan, Ramakrishnan; Choi, Jae-Hak; Kim, Jin-Baek, ACS APPLIED MATERIALS & INTERFACES, v.5, no.20, pp.10253 - 10259, 2013-10
9	Micropatterning of proteins on ion beam-induced poly(acrylic acid)-grafted polyethylene film Kim, Dong-Ki; Ganesan, Ramakrishnan; Jung, Chan-Hee; Hwang, In-Tae; Choi, Jae-Hak; Kim, Jin-Baek; Nho, Young-Chang; et al, POLYMERS FOR ADVANCED TECHNOLOGIES, v.22, no.12, pp.1989 - 1992, 2011-12
10	Non-Shrinkable Photoresist for Arf Lithography Kim, Jin-Baek; Oh, Tae-Hwan; Choi, Jae-Hak; Lee, Jae Jun, 한국고분자학회 2003년도 춘계학술대회, pp.0 - 0, 한국고분자학회, 2003-04
11	Non-Shrinkable Photoresist for Arf Lithography Kim, Jin-Baek; Oh, Tae-Hwan; Choi, Jae-Hak; Lee, Jae Jun, Advances in Resist Technology and Processing XIXI, pp.689 - 697, 2003-02-24
12	Novel molecular resists based on inclusion complex of cyclodextrin Kim, Jin-Baek; Kwon, Young-Gil; Yun, Hyo-Jin; Choi, Jae-Hak, Advances in Resist Technology and Processing XIX, pp.837 - 845, SPIE, 2002-03-04
13	Patterned grafting of acrylic acid onto polymer substrates Kim, Dong-Ki; Choi, You Mee; Jung, Chan-Hee; Kwon, Ho-Je; Choi, Jae-Hak; Nho, Young-Chang; Suh, Dong-Hack; et al, POLYMERS FOR ADVANCED TECHNOLOGIES, v.20, no.3, pp.173 - 177, 2009-03
14	Patterned Immobilization of Biomolecules by Using Ion Irradiation-Induced Graft Polymerization Choi, Jae-Hak; Ganesan, Ramakrishnan; Kim, Dong-Ki; Jung, Chan-Hee; Hwang, In-Tae; Nho, Young-Chang; Yun, Je-Moon; et al, JOURNAL OF POLYMER SCIENCE PART A-POLYMER CHEMISTRY, v.47, no.22, pp.6124 - 6134, 2009-11
15	PED-Stabilized Chemically Amplified Resists Containing Basic Units in the Matrix Polymers Kim, Jin-Baek; Choi, Jae-Hak; Kwon, Young-Gil, 한국고분자학회 1998년도 춘계 학술대회, v.23, no.1, pp.114 - 115, 한국고분자학회, 1998-04-10
16	Photobleachable silicon-containing molecular resist for deep UV lithography Kim, Jin-Baek; Ganesan, Ramakrishnan; Choi, Jae-Hak; Yun, Hyo-Jin; Kwon, Young-Gil; Kim, Kyoung-Seon; Oh, Tae-Hwan, JOURNAL OF MATERIALS CHEMISTRY, v.16, no.34, pp.3448 - 3451, 2006
17	Photosensitive Polymer Brushes Graft-Polymerized on PTFE Film for Patterned Protein Immobilization Yoon, Je Moon; Choi, Jae-Hak; Kim, Jin-Baek, 한국고분자학회 2009년도 춘계 학술대회 , 한국고분자학회, 2009-04-09
18	Photosensitive polymer brushes grafted onto PTFE film surface for micropatterning of proteins Yun, Je-Moon; Jung, Chan-Hee; Kim, Dong-Ki; Hwang, In-Tae; Choi, Jae-Hak; Ganesan, Ramakrishnan; Kim, Jin-Baek, JOURNAL OF MATERIALS CHEMISTRY, v.20, no.10, pp.2007 - 2012, 2010
19	Water-developable resists based on glyceryl methacrylate for 193-nm lithography Kim, Jin-Baek; Jang, Ji-Hyun; Choi, Jae-Hak; Lee, Kwan-Ku; Ko, Jong-Sung, Advances in Resist Technology and Processing XXI, v.5376, pp.616 - 624, 2004-02-23

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