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College of Natural Sciences(자연과학대학)Dept. of Chemistry(화학과)CH-Conference Papers(학술회의논문)

Non-Shrinkable Photoresist for Arf Lithography

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Kim, Jin-Baekresearcher / Oh, Tae-Hwan / Choi, Jae-Hak / Lee, Jae Jun
Issue Date
2003-02-24
Language
ENG
Citation

Advances in Resist Technology and Processing XIXI, pp.689 - 697

URI
http://hdl.handle.net/10203/140966
Appears in Collection
CH-Conference Papers(학술회의논문)
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