DSpace at KOASAS
Browsing DSpace

Browse by Author Oh, Y. J.

A to Z

All 0-9

A B C D E F G H I J K L M N O P Q R S T U V W X Y Z

or enter first few letters:

Showing results 1 to 11 of 11

1
Ab initio study of boron segregation and deactivation at Si/SiO2 interface

Oh, Y. J.; Hwang, J.-H.; Noh, H.-K.; Bang, J.; Ryu, B.; Chang, Kee-Joo, International Union of Materials Research Societies - International Conference on Electronic Materials 2010, 2010-08

2
Atomic and electronic structure of Li13Si4

Chang, Kee-Joo; Oh, Y. J.; Ryu, B., The 5th KIAS Electronic Structure Calculation Workshop, 2009-06

3
Boron segregation and effect of point defects in Si/SiO2 interface

Oh, Y. J.; Noh, H.-K.; Chang, Kee-Joo, The 14th Asian Workshop on First-Principles Electronic Structure Calculations, The University of Tokyo, 2011

4
Diffusion and segregation of B dopants at Si/SiO2 interface

Oh, Y. J.; Hwang, J.-H.; Noh, H.-K.; Bang, J.; Ryu, B.; Chang, Kee-Joo, The 13th Asian Workshop on First-Principles Electronic Structure Calculations, 2010-11

5
First-principles study on boron segregation at Si/SiO2 interface

Oh, Y. J.; Hwang, J.-H.; Noh, H.-K.; Bang, J.; Ryu, B.; Chang, Kee-Joo, 한국물리학회 가을학술논문발표회, 한국물리학회, 2010-10

6
Hyaluronic Acid Based Cisplatin Nanogel Selectively Inhibits Growth and Metastasis of Non-Small Cell Lung Cancer, Which Overexpresses CD44

Quan, Y. H.; Oh, Y. J.; Park, Ji-Ho; Choi, Y. H.; Kim, H. K., EUROPEAN JOURNAL OF CANCER, v.48, pp.35 - 35, 2012-11

7
Schottky barriers and work functions of Ni/HfO2 and Ni/SiO2 gate stacks

Noh, HK; Oh, Y. J.; Chang, Kee-Joo, The 14th Asian Workshop on First-Principles Electronic Structure Calculations, The University of Tokyo, 2011

8
Segregation of B dopants in Si/SiO2 interface

Oh, Y. J.; Hwang, J.-H.; Noh, H.-K.; Bang, J.; Ryu, B.; Chang, Kee-Joo, The 6th KIAS Electronic Structure Calculation Workshop, KIAS, 2010-06

9
Stability and segregation of boron dopants at the Si/SiO2 interface

Oh, Y. J.; Hwang, J.-H.; Noh, H.-K.; Bang, J.; Ryu, B.; Chang, Kee-Joo, 2011 Materials Research Society (MRS) Spring Meeting, Materials Research Society, 2011-04

10
Stability of boron dopants at the Si/SiO2 interface

Oh, Y. J.; Hwang, J.-H.; Noh, H.-K.; Bang, J.; Ry, B.; Chang, Kee-Joo, The 18th Korean Conference on Semiconductors, KCS, 2011-02

11
Stability of boron dopants near the interface between Si and amorphous SiO2

Oh, Y. J.; Noh, H.-K.; Chang, Kee-Joo, 3rd ACCMS Working Group Meeting on Advances in Nano-device Simulation v. no. , ACCMS , 2011-03

Discover

rss_1.0 rss_2.0 atom_1.0