Stability of boron dopants near the interface between Si and amorphous SiO2

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Description
물리학과
Publisher
ACCMS
Issue Date
2011-03
Language
English
Citation

3rd ACCMS Working Group Meeting on Advances in Nano-device Simulation v. no.

URI
http://hdl.handle.net/10203/168571
Appears in Collection
PH-Conference Papers(학술회의논문)
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