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College of Natural Sciences(자연과학대학)Dept. of Physics(물리학과)PH-Conference Papers(학술회의논문)

Ab initio study of boron segregation and deactivation at Si/SiO2 interface

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Oh, Y. J. / Hwang, J.-H. / Noh, H.-K. / Bang, J. / Ryu, B. / Chang, Kee-Jooresearcher
Issue Date
2010-08
Language
ENG
Citation

International Union of Materials Research Societies - International Conference on Electronic Materials 2010

URI
http://hdl.handle.net/10203/166284
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PH-Conference Papers(학술회의논문)
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