Schottky barriers and work functions of Ni/HfO2 and Ni/SiO2 gate stacks
- Publisher
- The University of Tokyo
- Issue Date
- 2011
- Language
- ENG
- Citation
The 14th Asian Workshop on First-Principles Electronic Structure Calculations
- Appears in Collection
- PH-Conference Papers(학술회의논문)
- Files in This Item
- There are no files associated with this item.
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