DSpace at KOASAS: Stability and segregation of boron dopants at the Si/SiO2 interface

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College of Natural Sciences(자연과학대학)Dept. of Physics(물리학과)PH-Conference Papers(학술회의논문)

Stability and segregation of boron dopants at the Si/SiO2 interface

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Oh, Y. J. / Hwang, J.-H. / Noh, H.-K. / Bang, J. / Ryu, B. / Chang, Kee-Joo researcher

Publisher: Materials Research Society

Issue Date: 2011-04

Language: ENG

Citation: 2011 Materials Research Society (MRS) Spring Meeting

URI: http://hdl.handle.net/10203/168328

Appears in Collection: PH-Conference Papers(학술회의논문)

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Stability and segregation of boron dopants at the Si/SiO2 interface

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