EFFECTS OF DEPOSITION RATE ON THE ENCROACHMENT IN TUNGSTEN FILMS REDUCED BY H-2

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The deposition rate of tungsten selectively prepared by hydrogen reduction of WF6 was measured, and the encroachment produced by inherent silicon reduction even in the presence of H-2 gas was examined by cross-sectional TEM and SEM. In the WF6-H2 system, the degree of encroachment is not explained by the Si reduction reaction alone, but is rather related to the Si reduction time decreasing with increasing deposition rate of H-2-reduced tungsten film, because a blocking layer is formed above the Si-reduced tungsten. This results in a lesser degree of encroachment. Consequently a high deposition rate of H-2-reduced tungsten can decrease the degree of encroachment. By calculation, a thickness of 6.8-13.3 nm is necessary for H-2-reduced tungsten to prevent WF6 gas from reacting with Si.
Publisher
CHAPMAN HALL LTD
Issue Date
1991-10
Language
English
Article Type
Article
Keywords

CVD; WF6

Citation

JOURNAL OF MATERIALS SCIENCE, v.26, no.19, pp.5318 - 5322

ISSN
0022-2461
URI
http://hdl.handle.net/10203/56762
Appears in Collection
MS-Journal Papers(저널논문)RIMS Journal Papers
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