DC Field | Value | Language |
---|---|---|
dc.contributor.author | PARK, YW | ko |
dc.contributor.author | KIM, IL | ko |
dc.contributor.author | Park, Chong-Ook | ko |
dc.contributor.author | Chun , Soung Soon | ko |
dc.date.accessioned | 2013-02-24T11:18:09Z | - |
dc.date.available | 2013-02-24T11:18:09Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 1991-10 | - |
dc.identifier.citation | JOURNAL OF MATERIALS SCIENCE, v.26, no.19, pp.5318 - 5322 | - |
dc.identifier.issn | 0022-2461 | - |
dc.identifier.uri | http://hdl.handle.net/10203/56762 | - |
dc.description.abstract | The deposition rate of tungsten selectively prepared by hydrogen reduction of WF6 was measured, and the encroachment produced by inherent silicon reduction even in the presence of H-2 gas was examined by cross-sectional TEM and SEM. In the WF6-H2 system, the degree of encroachment is not explained by the Si reduction reaction alone, but is rather related to the Si reduction time decreasing with increasing deposition rate of H-2-reduced tungsten film, because a blocking layer is formed above the Si-reduced tungsten. This results in a lesser degree of encroachment. Consequently a high deposition rate of H-2-reduced tungsten can decrease the degree of encroachment. By calculation, a thickness of 6.8-13.3 nm is necessary for H-2-reduced tungsten to prevent WF6 gas from reacting with Si. | - |
dc.language | English | - |
dc.publisher | CHAPMAN HALL LTD | - |
dc.subject | CVD | - |
dc.subject | WF6 | - |
dc.title | EFFECTS OF DEPOSITION RATE ON THE ENCROACHMENT IN TUNGSTEN FILMS REDUCED BY H-2 | - |
dc.type | Article | - |
dc.identifier.wosid | A1991GH99300028 | - |
dc.identifier.scopusid | 2-s2.0-34249918740 | - |
dc.type.rims | ART | - |
dc.citation.volume | 26 | - |
dc.citation.issue | 19 | - |
dc.citation.beginningpage | 5318 | - |
dc.citation.endingpage | 5322 | - |
dc.citation.publicationname | JOURNAL OF MATERIALS SCIENCE | - |
dc.contributor.localauthor | Park, Chong-Ook | - |
dc.contributor.localauthor | Chun , Soung Soon | - |
dc.contributor.nonIdAuthor | PARK, YW | - |
dc.contributor.nonIdAuthor | KIM, IL | - |
dc.type.journalArticle | Article | - |
dc.subject.keywordPlus | CVD | - |
dc.subject.keywordPlus | WF6 | - |
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