DSpace at KOASAS: Browsing DSpace

DSpace at KOASAS

Browsing DSpace

Browse "Dept. of Chemistry(화학과)" by Subject lithography

Sort by:
In order:
Results/Page
Authors/Record:

Showing results 1 to 13 of 13

1	A New Type of Eco-Friendly Resist Based on Nonchemically Amplified System Park, Ji Young; Yun, Je Moon; Kim, Jin-Baek, JOURNAL OF POLYMER SCIENCE PART A-POLYMER CHEMISTRY, v.46, no.22, pp.7534 - 7542, 2008-11
2	Fabrication of versatile metal oxide nanostructures using hybrid organic-inorganic materials and their applications = 유무기 하이브리드 물질을 이용한 다양한 메탈 옥사이드 나노구조체 제작과 그 응용 link Shin, Seungmin; 신승민; et al, 한국과학기술원, 2017
3	High performance molecular resists based on beta-cyclodextrin Kwon, Younggil; Yun, Hyojin; Ganesan, Ramakrishnan; Kim, Jin-Baek; Choi, Jae-Hak, POLYMER JOURNAL, v.38, no.9, pp.996 - 998, 2006
4	Mass Spectrometry Assisted Lithography for the Patterning of Cell Adhesion Ligands on Self-Assembled Monolayers Kim, Young-Kwan; Ryoo, Soo-Ryoon; Kwack, Sul-Jin; Min, Dal-Hee, ANGEWANDTE CHEMIE-INTERNATIONAL EDITION, v.48, no.19, pp.3507 - 3511, 2009
5	Molecular and polymeric resists for deep UV lithography = Deep UV 리소그라피용 분자 및 고분자 레지스트에 관한 연구 link Ganesan, Ramakrishnan; 가네산, 라마크리시난; et al, 한국과학기술원, 2006
6	Non-shrinkable and nanomolecular resists for DUV lithography = 비수축성 레지스트와 나노분자 레지스트에 관한 연구 link Oh, Tae-Hwan; 오태환; et al, 한국과학기술원, 2006
7	Novel photobleachable deep UV resists based on single component nonchemically amplified resist system Kim, Jin-Baek; Kim, KS, MACROMOLECULAR RAPID COMMUNICATIONS, v.26, no.17, pp.1412 - 1417, 2005-09
8	Novel top-surface imaging process by selective chemisorption of poly(dimethyl siloxane) on diazoketo-functionalized single component photoresist Ganesana, Ramakrishnan; Youna, Seul-Ki; Kim, Jin-Baek, MACROMOLECULAR RAPID COMMUNICATIONS, v.29, no.5, pp.437 - 441, 2008-03
9	One-Step Modification of Superhydrophobic Surfaces by a Mussel-Inspired Polymer Coating Kang, SM; You, I; Cho, WK; Shon, HK; Lee, TG; Choi, Insung; Karp, JM; et al, ANGEWANDTE CHEMIE-INTERNATIONAL EDITION, v.49, no.49, pp.9401 - 9404, 2010
10	Polymeric and molecular resists for short wavelength lithography = 단파장 리소그라피용 고분자 및 분자 레지스트 link Yun, Hyo-Jin; 윤효진; et al, 한국과학기술원, 2002
11	Selective positioning of thermo curable materials using photolithography = 리소그래피를 이용한 열경화성 물질의 선택적 도포에 관한 연구 link Cho, Young-Ook; 조영욱; et al, 한국과학기술원, 2013
12	Synthesis of copolymers with diazo groups and their application as DUV resists = 다이아조기를 포함하는 고분자의 합성과 레지스트로서의 응용 link Kim, Kyoung-Seon; 김경선; et al, 한국과학기술원, 2005
13	Synthesis of norbornene copolymers with β-keto ester groups and their application as photoresists = 베타-케토 에스테르기를 노르보넨 측쇄에 함유하는 공중합체의 합성과 포토레지스트로서의 응용 link Kim, Kyoung-Seon; 김경선; et al, 한국과학기술원, 2001

Discover

KOASAS

Knowledge Service Development Team, KAIST 291 Daehak-ro, Yuseong-gu, Daejeon 34141, Republic of Korea. T. 82-42-350-4493 Email. koasas@kaist.ac.kr
Copyright © 2016. Korea Advanced Institute of Science and Technology. All Rights Reserved.

Communities & Collections

rss_1.0 rss_2.0 atom_1.0