| 1 | Composition control of lead zirconate titanate thin films in electron cyclotron resonance plasma enhanced chemical vapor deposition system Kim, JW; Shin, JS; Wee, Dang-Moon; No, Kwangsoo; Lee, Won-Jong, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS, v.35, no.5A, pp.2726 - 2730, 1996-05 |
| 2 | ECR PE-MOCVD법에 의해 증착된 $PbTiO_3$, PLT 박막의 특성에 관한 연구 = A study on the characteristics of $PbTiO_3$, PLT thin films deposited by ECR PE-MOCVDlink 정성웅; Chung, Sung-Woong; et al, 한국과학기술원, 1996 |
| 3 | ECR 플라즈마 기상화학증착법으로 제조한 초고집적회로 금속화공정의 확산방지용 TiN 박막의 특성 = The characteristics of TiN thin films prepared by ECR-PECVD as a diffusion barrier layer in ULSI metallization processlink 김종석; Kim, Jong-Seok; et al, 한국과학기술원, 1997 |
| 4 | ECR-PECVD 법으로 제조한 PZT 박막의 물성 연구 = Characteriszation of PZT thin films prepared by ECR-PECVDlink 김재환; Kim, Jae-Whan; 위당문; 이원종; et al, 한국과학기술원, 1996 |
| 5 | Effect of Gas Composition on TiN Thin-Film Fabrication in N2/H2/Ar/TiCl4 Inductively Coupled Plasma-Enhanced Chemical Vapor Deposition System Jang, SS; Lee, Won-Jong, JAPANESE JOURNAL OF APPLIED PHYSICS, v.40, no.8, pp.4819 - 4824, 2001-08 |
| 6 | Effect of H-2 addition during PECVD on the moisture barrier property and environmental stability of H:SiNx film Kim, Jin Kyoo; Jeong, Wooseok; Lee, Seunghee; Jeong, Sehun; Park, Sang-Hee Ko, JOURNAL OF THE AMERICAN CERAMIC SOCIETY, v.104, no.12, pp.6670 - 6677, 2021-12 |
| 7 | Effects of process parameters on titanium dioxide thin film deposited using ECR MOCVD Lee, JS; Song, HW; Lee, WJ; Yu, BG; No, Kwangsoo, THIN SOLID FILMS, v.287, no.1-2, pp.120 - 124, 1996-10 |
| 8 | Fabrication of perovskite (Pb,La)(Zr,Ti)O-3 thin films by electron cyclotron resonance plasma enhanced chemical vapor deposition Shin, JS; No, Kwangsoo; Lee, Won-Jong, JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, v.36, no.2B, pp.223 - 226, 1997-02 |
| 9 | Fabrication of Vertical Carbon Nanotube Arrays from Self-Assembled Block Copolymer Films Lee, Duck-Hyun; Shin, Dong-Ok; Lee, Won-Jong; Kim, Sang-Ouk, JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, v.8, no.10, pp.5571 - 5575, 2008-10 |
| 10 | Formation of a Lead Zirconate Titanate (PZT)/Pt Interfacial Layer and Structural Changes in the Pt/Ti/SiO 2/Si Substrate during the Deposition of PZT Thin Film by Electron Cyclotron Resonance Plasma-Enhanced Chemical Vapor Deposition Chung, Su-Ock; Kim, Jae Whan; Kim, Geun Hong; Park, Chong Ook; Lee, Won Jong, Japanese Journal of Applied Physics, Vol.36, pp.4386-4391, 1997-07-15 |
| 11 | Formation of a lead zirconate titanate (PZT)/Pt interfacial layer and structural changes in the Pt/Ti/SiO2/Si substrate during the deposition of PZT thin film by electron cyclotron resonance plasma-enhanced chemical vapor deposition Chung, SO; Kim, JW; Kim, GH; Park, Chong-Ook; Lee, Won-Jong, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, v.36, no.7, pp.4386 - 4391, 1997-01 |
| 12 | MICROSTRUCTURE AND ELECTRICAL-PROPERTIES OF TANTALUM OXIDE THIN-FILM PREPARED BY ELECTRON-CYCLOTRON-RESONANCE PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION KIM, I; AHN, SD; CHO, BW; Ahn, SungTae; Lee, JeongYong; CHUN, JS; Lee, Won-Jong, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS, v.33, no.12A, pp.6691 - 6698, 1994-12 |
| 13 | (Pb,La)(Zr,Ti)O-3 thin films prepared by electron cyclotron resonance plasma enhanced chemical vapor deposition for the charge storage capacitor of a gigabit-scale dynamic random access memory Shin, JS; Lee, Won-Jong, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS, v.37, no.1, pp.198 - 203, 1998-01 |
| 14 | The effects of substrate temperature and lead precursor flow rate on the fabrication of (Pb,La)(Zr,Ti)O-3 thin films by electron cyclotron resonance plasma-enhanced chemical vapor deposition Shin, JS; Chun , Soung Soon; Lee, Won-Jong, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS, v.36, no.4A, pp.2200 - 2206, 1997-04 |
