ECR 플라즈마 기상화학증착법으로 제조한 초고집적회로 금속화공정의 확산방지용 TiN 박막의 특성 = The characteristics of TiN thin films prepared by ECR-PECVD as a diffusion barrier layer in ULSI metallization process

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Advisors
이원종researcherLee, Won-Jongresearcher
Description
한국과학기술원 : 재료공학과,
Publisher
한국과학기술원
Issue Date
1997
Identifier
113002/325007 / 000935085
Language
kor
Description

학위논문(박사) - 한국과학기술원 : 재료공학과, 1997.2, [ [iv], 112 p. ]

Keywords

피복성; 확산방지; 티타늄질화막; 이시알플라즈마; ECR; Step coverage; Diffusion barrier; TiN; PECVD

URI
http://hdl.handle.net/10203/50341
Link
http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=113002&flag=dissertation
Appears in Collection
MS-Theses_Ph.D.(박사논문)
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