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Showing results 1 to 14 of 14

1
Bilayer Resists Based on Polyhedral Oligomeric Silsesquioxane for 193-nm Lithography

Ganesan, Ramakrishnan; Choi, Jae-Hak; Kim, Kyoung-Seon; Oh, Tae-Hwan; Yun, Hyo-Jin; Kwon, Young-Gil; Kim, Jin-Baek, SPIE-The International Society for Optical Engineering, pp.0, SPIE, 2005-02-27

2
Molecular resists based on t-butyl cholate Derivatives for 193nm photoresists

Oh, Tae-Hwan; Kwon, Young-Gil; Kim, Jin-Baek, 한국고분자학회 2002년 추계학술대회 , pp.254 - 254, 한국고분자학회, 2002-10

3
Molecular resists with adamantane core for 193-nm lithography

Kim, Jin-Baek; Oh, Tae-Hwan; Kim, Kyung Mi, 대한화학회 2004년도 추계 학술회의, pp.0 - 0, 대한화학회, 2004-10

4
Molecular resists with t-butyl cholate as a dendrimer core

Kim, Jin-Baek; Oh, Tae-Hwan; Kwon, Young-Gil, Advances in Resist Technology and Processing XIX, pp.549 - 556, 2002-03-04

5
Molecular Resists with t-Butyl Cholate as a Dendrimer Core for 193 nm Photoresists

Kim, Jin-Baek; Oh, Tae-Hwan, Advances in Resist Technology and Processing XIX, pp.333, SPIE, 2002-03-04

6
Nanomolecular resists with adamantane core for 193-nm lithography

Kim, Jin-Baek; Oh, Tae-Hwan; Kim, Jin-Baek, Advances in Resist Technology and Processing XXII, pp.603 - 610, SPIE, 2005-02-28

7
Negative nanomolecular resists based on calix[4]resocinarene

Oh, Tae-Hwan; Ganesan, Ramakrishnan; Yoon, Je-Moon; Kim, Jin-Baek, Advances in Resist Technology and Processing XXIII, SPIE, 2006-02-20

8
Non-shrinkable and nanomolecular resists for DUV lithography = 비수축성 레지스트와 나노분자 레지스트에 관한 연구link

Oh, Tae-Hwan; 오태환; et al, 한국과학기술원, 2006

9
Non-Shrinkable Photoresist for Arf Lithography

Kim, Jin-Baek; Oh, Tae-Hwan; Choi, Jae-Hak; Lee, Jae Jun, 한국고분자학회 2003년도 춘계학술대회, pp.0 - 0, 한국고분자학회, 2003-04

10
Non-Shrinkable Photoresist for Arf Lithography

Kim, Jin-Baek; Oh, Tae-Hwan; Choi, Jae-Hak; Lee, Jae Jun, Advances in Resist Technology and Processing XIXI, pp.689 - 697, 2003-02-24

11
Non-shrinkable photoresists based on camphor for ArF lithography

Oh, Tae-Hwan; Huh, Yun Hee; Kim, Jin-Baek, 한국고분자학회 2004년도 춘계학술대회, pp.0 - 0, 한국고분자학회, 2004-04

12
Photobleachable silicon-containing molecular resist for deep UV lithography

Kim, Jin-Baek; Ganesan, Ramakrishnan; Choi, Jae-Hak; Yun, Hyo-Jin; Kwon, Young-Gil; Kim, Kyoung-Seon; Oh, Tae-Hwan, JOURNAL OF MATERIALS CHEMISTRY, v.16, no.34, pp.3448 - 3451, 2006

13
Synthesis of Methacrylate Polymers Substituted with Cholate Derivatives with Polar Spacer and its Lithographic Application

Oh, Tae-Hwan; Kim, Jin-Baek, 한국고분자학회 2001년도 추계학술대회 , pp.162 - 162, 한국고분자학회, 2001-10

14
Synthesis of methacrylate polymers substituted with cholic acid derivatives with polar spacer and their lithographic application = 담즙산 유도체를 포함하고 극성 사슬을 갖는 메타크릴 공중합체의 합성과 포토레지스트로서의 응용link

Oh, Tae-Hwan; 오태환; et al, 한국과학기술원, 2002

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