Nanomolecular resists with adamantane core for 193-nm lithography

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Publisher
SPIE
Issue Date
2005-02-28
Language
English
Citation

Advances in Resist Technology and Processing XXII, pp.603 - 610

ISSN
1605-7422
URI
http://hdl.handle.net/10203/150845
Appears in Collection
CH-Conference Papers(학술회의논문)
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