Molecular Resists with t-Butyl Cholate as a Dendrimer Core for 193 nm Photoresists

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Publisher
SPIE
Issue Date
2002-03-04
Language
English
Citation

Advances in Resist Technology and Processing XIX, pp.333

URI
http://hdl.handle.net/10203/125732
Appears in Collection
CH-Conference Papers(학술회의논문)
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