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Showing results 156741 to 156760 of 279498

156741
Plasma-enhanced atomic layer deposition of Ru-TiN thin films for copper diffusion barrier metals

Kwon, SH; Kwon, OK; Min, JS; Kang, SW, JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.153, no.6, pp.G578 - G581, 2006

156742
Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for the Application of Cu Diffusion Barrier

KANG SANG WON, AVS 6th International Conference on Atomic Layer Deposition, pp.0 - 0, 2004-08-01

156743
Plasma-enhanced atomic layer deposition of ruthenium thin films

Kwon, OK; Kwon, SH; Park, HS; Kang, SW, ELECTROCHEMICAL AND SOLID STATE LETTERS, v.7, no.4, pp.C46 - C48, 2004

156744
Plasma-enhanced atomic layer deposition of Ta(C)N thin films for copper diffusion barrier

Kim K.H.; Seong-Jun Jeong; Yoon J.S.; Kim Y.M.; Kwon S.H., 5th Symposium on Atomic Layer Deposition - 216th Meeting of the Electrochemical Society, v.25, pp.301 - 308, 2009-10-05

156745
Plasma-enhanced atomic layer deposition of Ta-N thin films

Park, JS; Park, HS; Kang, Sang-Won, JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.149, no.1, pp.28 - 32, 2002-01

156746
Plasma-enhanced atomic layer deposition of TaN thin films using tantalum-pentafluoride and N-2/H-2/Ar plasma

Chung, Hoi-Sung; Kwon, Jung-Dae; Kang, Sang-Won, JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.153, no.11, pp.C751 - C754, 2006

156747
Plasma-enhanced atomic layer deposition of tantalum nitrides using hydrogen radicals as a reducing agent

Park, JS; Lee, MJ; Lee, CS; Kang, Sang-Won, ELECTROCHEMICAL AND SOLID STATE LETTERS, v.4, no.4, pp.17 - 19, 2001-04

156748
Plasma-Enhanced Atomic Layer Deposition of TiAlN

KANG SANG WON, 4th International AVS Conference on Microelectronics and Interfaces, pp.0 - 0, 2003-01-01

156749
Plasma-enhanced atomic layer deposition of TiN thin film using TiCl4 and N2/H2/Ar radicals

KANG SANG WON, Atomic layer Deposition (ALD) 2002, 2002-01-01

156750
Plasma-Enhanced Atomic Layer Deposition of Uniform Hexagonal Boron Nitride Films

Park, Hamin; Kim, Tae Keun; Cho, Sung Woo; Jang, Hong Seok; Lee, Sang Ick; Choi, Sung-Yool, MRS SPRING MEETING 2017, MRS SPRING MEETING 2017, 2017-04-20

156751
Plasma-Enhanced Atomic Layer Deposition Processed SiO2 Gate Insulating Layer for High Mobility Top-Gate Structured Oxide Thin-Film Transistors

Ko, Jong Beom; Yeom, Hye In; Park, Sang-Hee Ko, IEEE ELECTRON DEVICE LETTERS, v.37, no.1, pp.39 - 42, 2016-01

156752
Plasma-Enhanced Atomic Layer Depposition of HfO2 Thin Films Using Oxygen Plasma

Sang-Won Kang, 208th Meeting of The Electrochemical Society, 2005

156753
Plasma-Enhanced Chemical Vapor Deposition of Low-Resistive Tungsten Thin Films

Y.T.Kim; S.K.Min; J.S.Hong; Kim, Choong Ki, APPLIED PHYSICS LETTERS, v.58, no.8, pp.837 - 839, 1991-02

156754
Plasma-etched Nanofiber Anisotropic Conductive Films (ACFs) for Ultra Fine Pitch Interconnection

Lee, Sang Hoon; Kim, Tae Wan; Paik, Kyung-Wook, 65th Electronic Components and Technology Conference, IEEE Electronic Components and Technology Conference, 2015-05-27

156755
Plasma-Etching induced Damage to Thin Oxide

Hyung-Cheol Shin, IEEE/SEMI Advanced Semiconductor Manufacturing Conference, pp.79 - 83, 1992

156756
Plasma-functionalized solution and its applications

Park, Sanghoo; Choe, Wonho, 2nd Asia-Pacific Conference on Plasma Physics (AAPPS-DPP 2018), Division of Plasma physics, Association of Asia-PacificPhysical Societies, 2018-11-13

156757
Plasma-Functionalized Solution and Its Applications for Plasma Farming

Choe, Wonho; Park, Sanghoo, The 7th International Conference on Microelectronics and Plasma Technology, Songdo Convensia, 2018-07-24

156758
Plasma-functionalized solution: A potent antimicrobial agent for biomedical applications from antibacterial therapeutics to biomaterial surface engineering

Park, Joo Young; Choe, Wonho, The 71st Annual Gaseous Electronics Conference, American Physical Society, 2018-11-05

156759
Plasma-Functionalized Solution: A Potent Antimicrobial Agent for Biomedical Applications from Antibacterial Therapeutics to Biomaterial Surface Engineering

Park, Jooyoung; Park, Sanghoo; Choe, Wonho; Yong, Hae In; Jo, Cheorun; Kim, Kijung, ACS APPLIED MATERIALS & INTERFACES, v.9, no.50, pp.43470 - 43477, 2017-12

156760
Plasma-induced frequency chirp of intense femtosecond lasers and its role in shaping high-order harmonic spectral lines

Kim, JH; Nam, Chang Hee, PHYSICAL REVIEW A, v.65, no.3, 2002-03

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