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Showing results 156661 to 156680 of 279416
| Plasma-activated evaporation 방법에 의해 증착된 copper phthalocyanine 박막의 구조분석 = Structural analysis of copper phthalocyanine thin films prepared by plasma-activated evaporationlink 김준태; Kim, Jun-Tae; et al, 한국과학기술원, 1992 |
| Plasma-Assisted Catalytic Effects of TiO2/Macroporous SiO(2)on the Synthesis of Light Hydrocarbons from Methane Kim, Juchan; Kim, Seongseop; Lee, Namheon; Lim, Chaesung; Han, Jeong Woo; Lee, Jinwoo; Ha, Kyoung-Su, CHEMCATCHEM, v.12, no.20, pp.5067 - 5075, 2020-10 |
| Plasma-Assisted CMP for Planarization of Adhesive Polymers in 3D Stacked Semiconductor Devices Kang, Sukkyung; Park, Juseong; Jeon, Chan Su; Kim, Kyung Min; Kim, Sanha, International Conference on Planarization/CMP Technology, ICPT 2023, International Conference on Planarization Technology (ICPT), 2023-11-01 |
| Plasma-Assisted Etching 에서 식각 패턴 형성에 관한 연구 장충석, Bull. Kor. Phy. Soc., pp.204 - 204, 1995 |
| Plasma-Assisted Etching에서 식각패턴 형성에 관한 연구 최덕인, 한국물리학회, pp.196 -, 1995 |
| Plasma-assisted formation of metallic nickel domains on nickel-iron-molybdenum oxyhydroxide for efficient, electrocatalytic oxygen-evolution reaction Moon, Byeong Cheul; Kang, Jeung Ku, 2019 ACS National Meeting & Exposition, American Chemical Society, 2019-04-02 |
| Plasma-assisted molecular beam epitaxy of In xGa 1-XN films on: C-plane sapphire substrates Shin, EunJung; Seok, LimDong; Lim, SeHwan; Han, SeokKyu; Lee, HyoSung; Hong, SoonKu; Joeng, Myoungho; et al, Korean Journal of Materials Research, v.22, no.4, pp.185 - 189, 2012-04 |
| Plasma-assisted molecular-beam epitaxy of ZnO films on (0001) Al2O3: Effects of the MgO buffer layer thickness Kim, Jae Goo; Han, Seok Kyu; Kang, Dong-Suk; Yang, Sang Mo; Hong, Soon-Ku; Lee, Jae Wook; Lee, Jeong Yong; et al, JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.53, no.1, pp.271 - 275, 2008-07 |
| Plasma-Assisted Multi-Metallic Oxyhydroxides for Efficient Electrocatalytic Oxygen Evolution Reaction Moon, Byeong Cheul; Kang, Jeung Ku, 2018 IUMRS-ICEM, The Materials Research Society of Korea, Internatinal Union of Materials Research Societies, 2018-08-21 |
| Plasma-assisted selective catalytic reduction of NOx over Ag/γ-Al2O3 with dodecane as reducing agent at low temperature Nguyen, Duc Ba; Matyakubov, Nosir; Saud, Shirjana; 목영선; 이수민; 명재욱, 한국화학공학회 2021년도 봄 총회 및 학술대회, 한국화학공학회, 2021-04-23 |
| Plasma-assisted water-based Al2O3 ceramic coating for polyethylene-based microporous separators for lithium metal secondary batteries Jeon, Hyunkyu; Jin, So Yeon; Park, Won Ho; Lee, Hongkyung; Kim, Hee-Tak; Ryou, Myung-Hyun; Lee, Yong Min, ELECTROCHIMICA ACTA, v.212, pp.649 - 656, 2016-09 |
| PLASMA-CONCENTRATION OF ATRIAL NATRIURETIC PEPTIDE IN DIFFERENT PHASES OF KOREAN HEMORRHAGIC-FEVER CHO, KW; KIM, SH; Koh, Gou Young; SEUL, KH; HUH, KS; CHU, D; RAPP, NS; et al, NEPHRON, v.51, no.2, pp.215 - 219, 1989-02 |
| Plasma-Electron Coirradiation induced Fabrication of Hexagonal Non-Close-Packed Colloidal crystal monolayer 김재준; 조성오, 한국원자력학회 춘계학술대회, 한국원자력학회, 2011-05-25 |
| Plasma-enhanced ALD of titanium-silicon-nitride using TiCl4, SiH4, and N-2/H-2/Ar plasma Park, JS; Kang, SW, ELECTROCHEMICAL AND SOLID STATE LETTERS, v.7, no.8, pp.C87 - C89, 2004 |
| Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4, SiH4, and N2/H2/Ar Plasma KANG SANG WON, Atomic Layer Deposition (ALD) 2002, 2002-01-01 |
| Plasma-Enhanced Atomic Layer Deposition of Aluminum Grown by a Sequential Supply of TMA and H2 Kang, Sang-Won, 3rd International AVS Conference on Microelectronics and Interfaces, ICMI, 2002-02 |
| Plasma-enhanced atomic layer deposition of HfO2 thin films using oxygen plasma Park, P.K.; Kang, Sungwon, 208th Meeting of The Electrochemical Society, pp.915 -, 2005-10-16 |
| Plasma-enhanced atomic layer deposition of Ir thin films for copper adhesion layer Jeong S.-J.; Shin Y.R.; Kwack W.S.; Lee H.W.; Jeong Y.K.; Kim D.I.; Kim H.C.; et al, SURFACE & COATINGS TECHNOLOGY, v.205, no.21-22, pp.5009 - 5013, 2011-08 |
| Plasma-enhanced atomic layer deposition of Ru-TiN thin films for copper diffusion barrier metals Kwon, SH; Kwon, OK; Min, JS; Kang, SW, JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.153, no.6, pp.G578 - G581, 2006 |
| Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for the Application of Cu Diffusion Barrier KANG SANG WON, AVS 6th International Conference on Atomic Layer Deposition, pp.0 - 0, 2004-08-01 |
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