DC Field | Value | Language |
---|---|---|
dc.contributor.author | Lim, TW | ko |
dc.contributor.author | Son, Y | ko |
dc.contributor.author | Yang, Dong-Yol | ko |
dc.contributor.author | Kong, Hong-Jin | ko |
dc.contributor.author | Lee, KS | ko |
dc.contributor.author | Park, SH | ko |
dc.date.accessioned | 2010-05-20T08:22:21Z | - |
dc.date.available | 2010-05-20T08:22:21Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 2008-08 | - |
dc.identifier.citation | APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, v.92, pp.541 - 545 | - |
dc.identifier.issn | 0947-8396 | - |
dc.identifier.uri | http://hdl.handle.net/10203/18509 | - |
dc.description.abstract | Effective scanning is an important issue in two-photon induced stereolithography (TPS) for the reduction of the processing time required to fabricate three-dimensional (3D) nano/microstructures. In large-scale TPS based on a stage-scanning system, the large processing time due to the intrinsic slow response in the stage scanning system is a major obstacle to its use as a practical nanofabrication process. To overcome this drawback, we propose a continuous scanning method (CSM) for a stage-scanning system. In CSM, a pattern is generated with continuous movement of the stage during laser beam exposure. A stable fabrication window (SFW), which enables uniform motion of the stage without errors considering the stage characteristics, was obtained from fundamental experiments. Within the condition of a SFW, 2D and 3D microstructures having nanoscale details were fabricated with a whole scale range of several hundred micrometers using CSM. | - |
dc.language | English | - |
dc.language.iso | en_US | en |
dc.publisher | SPRINGER | - |
dc.subject | 2-PHOTON POLYMERIZATION | - |
dc.subject | FABRICATION | - |
dc.subject | PHOTOPOLYMERIZATION | - |
dc.title | Highly effective three-dimensional large-scale microfabrication using a continuous scanning method | - |
dc.type | Article | - |
dc.identifier.wosid | 000257912000017 | - |
dc.identifier.scopusid | 2-s2.0-48349138246 | - |
dc.type.rims | ART | - |
dc.citation.volume | 92 | - |
dc.citation.beginningpage | 541 | - |
dc.citation.endingpage | 545 | - |
dc.citation.publicationname | APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | - |
dc.embargo.liftdate | 9999-12-31 | - |
dc.embargo.terms | 9999-12-31 | - |
dc.contributor.localauthor | Yang, Dong-Yol | - |
dc.contributor.localauthor | Kong, Hong-Jin | - |
dc.contributor.nonIdAuthor | Lee, KS | - |
dc.contributor.nonIdAuthor | Park, SH | - |
dc.type.journalArticle | Article; Proceedings Paper | - |
dc.subject.keywordPlus | 2-PHOTON POLYMERIZATION | - |
dc.subject.keywordPlus | FABRICATION | - |
dc.subject.keywordPlus | PHOTOPOLYMERIZATION | - |
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