Atomic Arrangements of Asymmetrically-tilted Grain Boundaries in 30 degrees Rotation Domains of ZnO Thin Films Grown on n-Si Substrates

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Selected-area electron diffraction patterns for ZnO/Si heterostructures annealed at 800 degrees C showed that 30 degrees rotation domains were generated in the ZnO thin films. The plane-view high-resolution transmission electron microscopy (HRTEM) images for the ZnO thin films grown on n-Si substrates annealed at 800 degrees C showed that asymmetrical tilt grain boundaries were tilted by 16.5 degrees and 13.5 degrees from two grains with a 30 degrees tilted angle. The grain boundary planes of the two grains were (35 (8) over bar0) and (23 (5) over bar0). The atomic arrangements of the asymmetrically-tilted grain boundaries in 30 degrees rotation domains of ZnO thin films grown on n-Si substrates annealed at 800 degrees C are described on the basis of the HRTEM results.
Publisher
KOREAN PHYSICAL SOC
Issue Date
2009
Language
English
Article Type
Article; Proceedings Paper
Keywords

CHEMICAL-VAPOR-DEPOSITION; EPITAXIAL-FILMS; OPTICAL-PROPERTIES; ROOM-TEMPERATURE; BUFFER LAYER; DEPENDENCE; EMISSION; EDGE

Citation

JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.55, no.1, pp.246 - 249

ISSN
0374-4884
URI
http://hdl.handle.net/10203/94059
Appears in Collection
MS-Journal Papers(저널논문)
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