여러 분위기에서의 저온 열처리와 폴리머 기판의 표면 morphology가 비정질 Ta2O5 박막 커패시터에 미치는 영향

Abstract

Interest in the integrated capacitors, which make it possible to reduce the size of and to obtain improved electrical performance of an electronic system, is expanding. In this study, $Ta_2$O┌ thin film capacitors for MCM integrated capacitors were fabricated on a Upilex-S polymer film by DC magnetron reactive sputtering and the effects of low temperature annealing at various atmospheres and substrate surface morphology on the capacitor characteristics were discussed. The low temperature(150℃) annealing produced improved capacitor yield irrespective of the annealing at mosphere. But the leakage current of the O2-annealed film was larger than that of any other films. This is presumably mosphere. But the leakage current of the O2-annealed film was larger than that of any other films. This is presumably due to the change of the $Ta_2$O┌ film surface by oxygen, which was explained by conduction mechanism study. Leakage current and breakdown field strength of the capacitors fabricated on the Upilex-S film were 7.27x10┌A/cm² and 1.0 MV/cm respectively. These capacitor characteristics were inferior to those of the capacitors fabricated on the Si substrate but enough to be used for decoupling capacitors in multilayer package. Roughness Analysis of each layer by AFM demonstrated that the properties of the capacitors fabricated on the polymer film were affected by the surface morphology of the substrate. This substrate effect could be classified into two factors. One is the surface morphology of the polymer film and the other is the surface morphology of the metal bottom electrode determined by the deposition process. Therefore, the control of the two factors is important to obtain improved electrical of capacitors deposited on a polymer film.