HF 세정후 자연 산화막의 존재가 티타늄 실리사이드 형성에 미치는 영향The Effect of Native Oxide on the TiSi2 Transformation after HF Cleaning

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Publisher
한국재료학회
Issue Date
1998-12
Language
Korean
Citation

한국재료학회지, v.8, no.5, pp.464 - 469

ISSN
1225-0562
URI
http://hdl.handle.net/10203/68184
Appears in Collection
MS-Journal Papers(저널논문)
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