HF 세정후 자연 산화막의 존재가 티타늄 실리사이드 형성에 미치는 영향The Effect of Native Oxide on the TiSi2 Transformation after HF Cleaning
- Publisher
- 한국재료학회
- Issue Date
- 1998-12
- Language
- Korean
- Citation
한국재료학회지, v.8, no.5, pp.464 - 469
- ISSN
- 1225-0562
- Appears in Collection
- MS-Journal Papers(저널논문)
- Files in This Item
- There are no files associated with this item.
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