HF 세정후 자연 산화막의 존재가 티타늄 실리사이드 형성에 미치는 영향The Effect of Native Oxide on the TiSi2 Transformation after HF Cleaning
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 배종욱 | ko |
| dc.contributor.author | 현영철 | ko |
| dc.contributor.author | 유현규 | ko |
| dc.contributor.author | 이정용 | ko |
| dc.contributor.author | 남기수 | ko |
| dc.date.accessioned | 2013-02-27T11:16:00Z | - |
| dc.date.available | 2013-02-27T11:16:00Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 1998-12 | - |
| dc.identifier.citation | 한국재료학회지, v.8, no.5, pp.464 - 469 | - |
| dc.identifier.issn | 1225-0562 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/68184 | - |
| dc.language | Korean | - |
| dc.publisher | 한국재료학회 | - |
| dc.title | HF 세정후 자연 산화막의 존재가 티타늄 실리사이드 형성에 미치는 영향 | - |
| dc.title.alternative | The Effect of Native Oxide on the TiSi2 Transformation after HF Cleaning | - |
| dc.type | Article | - |
| dc.type.rims | ART | - |
| dc.citation.volume | 8 | - |
| dc.citation.issue | 5 | - |
| dc.citation.beginningpage | 464 | - |
| dc.citation.endingpage | 469 | - |
| dc.citation.publicationname | 한국재료학회지 | - |
| dc.contributor.localauthor | 이정용 | - |
| dc.contributor.nonIdAuthor | 배종욱 | - |
| dc.contributor.nonIdAuthor | 현영철 | - |
| dc.contributor.nonIdAuthor | 유현규 | - |
| dc.contributor.nonIdAuthor | 남기수 | - |
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