Study of Growth Rate and Failure Mode of Chemically Vapor Deposited TiN, TiCxNy and TiC on Cemented Tungsten Carbide

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dc.contributor.authorChun , Soung Soonko
dc.contributor.authorNam, Soo Wooko
dc.date.accessioned2013-02-25T15:28:20Z-
dc.date.available2013-02-25T15:28:20Z-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.issued1982-
dc.identifier.citationJOURNAL OF MATERIALS SCIENCE, v.17, no.9, pp.2495 - 2502-
dc.identifier.issn0022-2461-
dc.identifier.urihttp://hdl.handle.net/10203/63218-
dc.languageEnglish-
dc.publisherSpringer-
dc.titleStudy of Growth Rate and Failure Mode of Chemically Vapor Deposited TiN, TiCxNy and TiC on Cemented Tungsten Carbide-
dc.typeArticle-
dc.identifier.wosidA1982PH44800005-
dc.identifier.scopusid2-s2.0-12444336252-
dc.type.rimsART-
dc.citation.volume17-
dc.citation.issue9-
dc.citation.beginningpage2495-
dc.citation.endingpage2502-
dc.citation.publicationnameJOURNAL OF MATERIALS SCIENCE-
dc.contributor.localauthorChun , Soung Soon-
dc.type.journalArticleArticle-
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