Results 1-10 of 50 (Search time: 0.003 seconds).
NO | Title, Author(s) (Publication Title, Volume Issue, Page, Issue Date) |
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Half-Dimensional Model of the Plasma Distribution in ECR Plasma Moon, SJ; Kim, YJ; Chang, Choong-Seock; Chang, Hong-Young, The 2nd Asia-Pacific Conference on Plasma Science and Technology, 1995 | |
Production of high density plasma on the substrate in a helicon source and application to the deposition of SiOF film with low dielectric constant Kim, JH; Seo, SH; Yun, SM; Chang, Hong-Young, The Electrochemical society meeting, The Electrochemical society, 1995 | |
Status and characteristics of diagnostics on Korea Superconducting Tokamak Research(KSTAR) Chang, Hong-Young, , 1996 | |
Study of Helicon Wave Plasma Production and Its Characteristics Kim, JH; Seo, SH; Kim, YJ; Lee, PW; Chang, Hong-Young, 2nd APCPST, APCPST, 1994 | |
Mach probe measurement of flow velocity in RF plasma Yang Jang Gyoo; Chang, Hong-Young, The IEEE International Conference on Plasma Science, pp.179 -, IEEE, 1994-06-06 | |
Evolution of the electron energy distribution function in planar inductive discharges using rare gases Seo, S; Kim, S; Hong, J; Chang, C; Chang, Hong-Young, 52nd Annual Gaseous Electronic Conference, American Physical Society, 1999-10 | |
Electron temperature control with grid in inductively coupled Ar plasma Hong, IH; Seo, SH; Chang, Hong-Young, 43th International symp.American Vac. Soc, American Vacuum Society, 1996 | |
A Study on the Neutral Distributions through Spatial Profile of Plasma Emission in High Density Plasma Chang, Hong-Young, The 3rd Asia-Pacific Conference On Plasma Science and Technology, Plasma Science and Technology, 1996 | |
Nonlocal Electron Kinetics in a Planar Inductive Discharge Chang, Hong-Young, 17th Symposium on plasma processing(SPP17), 2000 | |
Characteristics of a new high frequency inductively coupled plama source Lee, DS; Chang, Hong-Young, 54th Annual Gaseous Electronics Conference, 2001-10 |
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