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Results 31-40 of 151 (Search time: 0.014 seconds).

NO Title, Author(s) (Publication Title, Volume Issue, Page, Issue Date)
31
Dry-developable Photorersist

Kim, Jin-Baek; Kim, Hyun-Woo; Kim, Jae-Young; Choi, Jae-Hak, 한국고분자학회 1997년도 추계 학술대회, pp.153 - 154, 한국고분자학회, 1997-10-11

32
A PED-stabilized Chemically Amplified Resist

Kim, Jin-Baek; Choi, Jae-Hak; Jung, Min Ho; Kim, Hyun-Woo, 한국고분자학회 1997년도 추계 학술대회 , pp.329 - 330, 한국고분자학회, 1997-10-11

33
Acid Diffusion Control in Chemically Amplified Positive Resists

Kwon, Young-Gil; Choi, Jae-Hak; Kim, Jin-Baek, 한국고분자학회 1998년도 춘계 학술대회 , pp.36 - 37, 한국고분자학회, 1998-04

34
Synthesis and Evaluation of a Novel Alicyclic Polymer Having 7,7-Dimethyloxepan-2-one Acid Labile Group for 193-nm Photoresists

Lee, Jae Jun; Kim, Jin-Baek, 한국고분자학회 2001년도 추계학술대회, pp.35 - 35, 한국고분자학회, 2001-10

35
New Class of Cholate-based Dissolution Inhibitor with Etch Resistance

Yun, Hyo-Jin; Kwon, Young-Gil; Lee, Jini; Kim, Jin-Baek, 한국고분자학회 2001년 추계학술대회 , pp.176 - 176, 한국고분자학회, 2001-10

36
Molecular resists based on t-butyl cholate Derivatives for 193nm photoresists

Oh, Tae-Hwan; Kwon, Young-Gil; Kim, Jin-Baek, 한국고분자학회 2002년 추계학술대회 , pp.254 - 254, 한국고분자학회, 2002-10

37
Synthesis and lithographic characterization of 1,4-dioxaspiro[4.7]dodecane-2-methyl methacrylate

Kim, Jin-Baek; Jang, Ji Hyun; Park, Jong Jin, 한국고분자학회 1998년도 추계 학술대회 , pp.284 - 285, 한국고분자학회, 1998-10

38
Chemically Amplified Resist based on the Methacrylate Polymer with 2-Trimethylsilyl-2-propyl Ester Protecting Group

Kim, Jin-Baek; Kim, Hyun-Woo, SPIE-The International Society for Optical Engineering, pp.420 - 428, Proceedings of SPIE, 1999-01

39
Dry-Developable Resist Based on Methacrylate Polymer with 2-Trimethylsilyl-2-Propyl Ester Group

Kim, Jin-Baek; Kim, Hyun-Woo, Asian Photochemistry Conference, 1999

40
Adhesion-promoted copolymers based on copolymers of norbornene derivatives and maleic anhydride for 193-nm photoresist

Yun, Hyo-Jin; Kwon, Young-Gil; Lee, Bum Wook; Kim, Jin-Baek, 한국고분자학회 1999 년도 추계 학술대회, pp.234 - 235, 한국고분자학회, 1999-10

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