Synthesis and Evaluation of a Novel Alicyclic Polymer Having 7,7-Dimethyloxepan-2-one Acid Labile Group for 193-nm Photoresists
- Publisher
- 한국고분자학회
- Issue Date
- 2001-10
- Language
- ENG
- Citation
한국고분자학회 2001년도 추계학술대회, pp.35 - 35
- Appears in Collection
- CH-Conference Papers(학술회의논문)
- Files in This Item
- There are no files associated with this item.
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