Results 1-10 of 12 (Search time: 0.006 seconds).
NO | Title, Author(s) (Publication Title, Volume Issue, Page, Issue Date) |
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A study on evaporation of photogenerated acid and base additives in chemically amplified positive resists Kim, Jin-Baek; Kwon, Young-Gil; Choi, Jae-Hak, 한국고분자학회 1998년도 추계 학술대회 , pp.264 - 265, 한국고분자학회, 1998-10 | |
PED-Stabilized Chemically Amplified Resists Containing Basic Units in the Matrix Polymers Kim, Jin-Baek; Choi, Jae-Hak; Kwon, Young-Gil, 한국고분자학회 1998년도 춘계 학술대회, v.23, no.1, pp.114 - 115, 한국고분자학회, 1998-04-10 | |
Water-developable resists based on glyceryl methacrylate for 193-nm lithography Kim, Jin-Baek; Jang, Ji-Hyun; Choi, Jae-Hak; Lee, Kwan-Ku; Ko, Jong-Sung, Advances in Resist Technology and Processing XXI, v.5376, pp.616 - 624, 2004-02-23 | |
Dry-developable Photorersist Kim, Jin-Baek; Kim, Hyun-Woo; Kim, Jae-Young; Choi, Jae-Hak, 한국고분자학회 1997년도 추계 학술대회, pp.153 - 154, 한국고분자학회, 1997-10-11 | |
A PED-stabilized Chemically Amplified Resist Kim, Jin-Baek; Choi, Jae-Hak; Jung, Min Ho; Kim, Hyun-Woo, 한국고분자학회 1997년도 추계 학술대회 , pp.329 - 330, 한국고분자학회, 1997-10-11 | |
Acid Diffusion Control in Chemically Amplified Positive Resists Kwon, Young-Gil; Choi, Jae-Hak; Kim, Jin-Baek, 한국고분자학회 1998년도 춘계 학술대회 , pp.36 - 37, 한국고분자학회, 1998-04 | |
Non-Shrinkable Photoresist for Arf Lithography Kim, Jin-Baek; Oh, Tae-Hwan; Choi, Jae-Hak; Lee, Jae Jun, 한국고분자학회 2003년도 춘계학술대회, pp.0 - 0, 한국고분자학회, 2003-04 | |
Non-Shrinkable Photoresist for Arf Lithography Kim, Jin-Baek; Oh, Tae-Hwan; Choi, Jae-Hak; Lee, Jae Jun, Advances in Resist Technology and Processing XIXI, pp.689 - 697, 2003-02-24 | |
Photosensitive Polymer Brushes Graft-Polymerized on PTFE Film for Patterned Protein Immobilization Yoon, Je Moon; Choi, Jae-Hak; Kim, Jin-Baek, 한국고분자학회 2009년도 춘계 학술대회 , 한국고분자학회, 2009-04-09 | |
Novel molecular resists based on inclusion complex of cyclodextrin Kim, Jin-Baek; Kwon, Young-Gil; Yun, Hyo-Jin; Choi, Jae-Hak, Advances in Resist Technology and Processing XIX, pp.837 - 845, SPIE, 2002-03-04 |
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