Browse "CH-Conference Papers(학술회의논문)" by Author Kwon, Young-Gil
Showing results 1 to 18 of 18
| A study on evaporation of photogenerated acid and base additives in chemically amplified positive resists Kim, Jin-Baek; Kwon, Young-Gil; Choi, Jae-Hak, 한국고분자학회 1998년도 추계 학술대회 , pp.264 - 265, 한국고분자학회, 1998-10 |
| Acid Diffusion and Evaporation in Chemically Amplified Resists Kim, Jin-Baek; Kwon, Young-Gil; Choi, Jae-Hak, Advances in Resist Technology and Processing XV, pp.536 - 543, SPIE, 1999-03-15 |
| Acid Diffusion Control in Chemically Amplified Positive Resists Kwon, Young-Gil; Choi, Jae-Hak; Kim, Jin-Baek, 한국고분자학회 1998년도 춘계 학술대회 , pp.36 - 37, 한국고분자학회, 1998-04 |
| Adhesion-promoted copolymers based on copolymers of norbornene derivatives and maleic anhydride for 193-nm photoresist Yun, Hyo-Jin; Kwon, Young-Gil; Lee, Bum Wook; Kim, Jin-Baek, 한국고분자학회 1999 년도 추계 학술대회, pp.234 - 235, 한국고분자학회, 1999-10 |
| Adhesion-promoted copolymers for 193-nm photoresists without cross-linking during lithographic process Yun, Hyo-Jin; Kwon, Young-Gil; Lee, Bum Wook; Kim, Jin-Baek, Journal of Photopolymer Science and Technology, pp.629 - 634, 2000-01 |
| Bilayer Resists Based on Polyhedral Oligomeric Silsesquioxane for 193-nm Lithography Ganesan, Ramakrishnan; Choi, Jae-Hak; Kim, Kyoung-Seon; Oh, Tae-Hwan; Yun, Hyo-Jin; Kwon, Young-Gil; Kim, Jin-Baek, SPIE-The International Society for Optical Engineering, pp.0, SPIE, 2005-02-27 |
| Chemically amplified resists based on methacrylate polymers with cholic acid derivatives Lee, Bum Wook; Yun, Hyo-Jin; Kwon, Young-Gil; Kim, Jin-Baek, 한국고분자학회 2000년 춘계 학술대회, pp.0 - 0, 한국고분자학회, 2000-04 |
| Chemically amplified resists based on the methacrylate polymers with cholic acid derivatives Kim, Jin-Baek; Lee, Bum Wook; Yun, Hyo-Jin; Kwon, Young-Gil, 한국고분자학회 2000년 춘계 학술대회, pp.42 - 42, 한국고분자학회, 2000 |
| Diffusion and surface evaporation of photogenerated acid in basic polymers for PED Stability of ArF chemically amplified resists Kwon, Young-Gil; Yun, Hyo-Jin; Lee, Bum Wook; Kim, Jin-Baek, 한국고분자학회 1999 년도 추계 학술대회, pp.250 - 251, 한국고분자학회, 1999-10 |
| Effects of florine for photoresists properties Kim, Young Woo; Kwon, Young-Gil; Lee, Jae Jun; Kim, Jin-Baek, 한국고분자학회 2002년 추계학술대회, pp.254 - 254, 한국고분자학회, 2002-10 |
| Hindered amine additives for post-exposure delay stability in ArF chemically amplified resists Kim, Jin-Baek; Kwon, Young-Gil; Yun, Hyo-Jin; Lee, Bum Wook, 한국고분자학회 2000년 춘계학술대회, pp.0 - 0, 한국고분자학회, 2000-04 |
| Molecular resists based on t-butyl cholate Derivatives for 193nm photoresists Oh, Tae-Hwan; Kwon, Young-Gil; Kim, Jin-Baek, 한국고분자학회 2002년 추계학술대회 , pp.254 - 254, 한국고분자학회, 2002-10 |
| Molecular resists with t-butyl cholate as a dendrimer core Kim, Jin-Baek; Oh, Tae-Hwan; Kwon, Young-Gil, Advances in Resist Technology and Processing XIX, pp.549 - 556, 2002-03-04 |
| New Class of Cholate-based Dissolution Inhibitor with Etch Resistance Yun, Hyo-Jin; Kwon, Young-Gil; Lee, Jini; Kim, Jin-Baek, 한국고분자학회 2001년 추계학술대회 , pp.176 - 176, 한국고분자학회, 2001-10 |
| Novel molecular resists based on inclusion complex of cyclodextrin Kim, Jin-Baek; Kwon, Young-Gil; Yun, Hyo-Jin; Choi, Jae-Hak, Advances in Resist Technology and Processing XIX, pp.837 - 845, SPIE, 2002-03-04 |
| PED-Stabilized Chemically Amplified Resists Containing Basic Units in the Matrix Polymers Kim, Jin-Baek; Choi, Jae-Hak; Kwon, Young-Gil, 한국고분자학회 1998년도 춘계 학술대회, v.23, no.1, pp.114 - 115, 한국고분자학회, 1998-04-10 |
| Silicon Containing Bilayer Resist Lee, Jini; Yun, Hyo-Jin; Kwon, Young-Gil; Kim, Jin-Baek, 한국고분자학회 2001년 추계학술대회, pp.162 - 162, 한국고분자학회, 2001-10 |
| The effects of functional group on cross-linking and shelf life of resists Yun, Hyo-Jin; Kwon, Young-Gil; Lee, Bum Wook; Kim, Jin-Baek, 한국고분자학회 2000년 춘계학술대회, 한국고분자학회, 2000-04 |
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