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Showing results 6 to 11 of 11

6
Nanomolecular resists with adamantane core for 193-nm lithography

Kim, Jin-Baek; Oh, Tae-Hwan; Kim, Jin-Baek, Advances in Resist Technology and Processing XXII, pp.603 - 610, SPIE, 2005-02-28

7
Negative nanomolecular resists based on calix[4]resocinarene

Oh, Tae-Hwan; Ganesan, Ramakrishnan; Yoon, Je-Moon; Kim, Jin-Baek, Advances in Resist Technology and Processing XXIII, SPIE, 2006-02-20

8
Non-Shrinkable Photoresist for Arf Lithography

Kim, Jin-Baek; Oh, Tae-Hwan; Choi, Jae-Hak; Lee, Jae Jun, 한국고분자학회 2003년도 춘계학술대회, pp.0 - 0, 한국고분자학회, 2003-04

9
Non-Shrinkable Photoresist for Arf Lithography

Kim, Jin-Baek; Oh, Tae-Hwan; Choi, Jae-Hak; Lee, Jae Jun, Advances in Resist Technology and Processing XIXI, pp.689 - 697, 2003-02-24

10
Non-shrinkable photoresists based on camphor for ArF lithography

Oh, Tae-Hwan; Huh, Yun Hee; Kim, Jin-Baek, 한국고분자학회 2004년도 춘계학술대회, pp.0 - 0, 한국고분자학회, 2004-04

11
Synthesis of Methacrylate Polymers Substituted with Cholate Derivatives with Polar Spacer and its Lithographic Application

Oh, Tae-Hwan; Kim, Jin-Baek, 한국고분자학회 2001년도 추계학술대회 , pp.162 - 162, 한국고분자학회, 2001-10

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