Browse "MS-Journal Papers(저널논문)" by Title 

Showing results 521 to 540 of 7226

521
Atomic arrangement and formation mechanism of c-axis oriented ZnO thin films grown on p-Si substrates

Park, N.K.; Lee, H.S.; No, Y.S.; Kim, T.W.; Lee, JeongYong; Choi, W.K., DIFFUSION AND DEFECT DATA PT.B: SOLID STATE PHENOMENA, v.124-126, no.PART 1, pp.93 - 96, 2007-05

522
Atomic arrangement variations of 30 degrees in-plane rotation domain boundaries in ZnO thin films grown on Si substrates due to thermal annealing

Shin, JW; Lee, JeongYong; No, YS; Kim, TW; Choi, WK, JOURNAL OF MATERIALS RESEARCH, v.24, pp.2006 - 2010, 2009-06

523
Atomic arrangement variations of [0001]-tilt grain boundaries in ZnO thin films grown on p-Si substrates due to thermal treatment

Shin, JW; Lee, JeongYong; No, YS; Jung, JH; Kim, TW; Choi, WK, APPLIED PHYSICS LETTERS, v.90, no.18, 2007-04

524
Atomic arrangements and formation mechanisms of the CuPt-type ordered structure in CdxZn1-xTe epilayers grown on GaAs substrates

Kim, TW; Lee, DU; Choo, DC; Lee, HS; Lee, JeongYong; Park, HL, APPLIED PHYSICS LETTERS, v.78, no.7, pp.922 - 924, 2001-02

525
Atomic arrangements of (Ga(1-x)Mn(x))N nanorods grown on Al(2)O(3) substrates

Lee, Kyu Hyung; Lee, JeongYong; Jung, J. H.; Kim, T. W.; Jeon, H. C.; Kang, T. W., APPLIED PHYSICS LETTERS, v.92, no.14, 2008-04

526
Atomic arrangements of a CuAu-I type ordered structure in strained InxGa1-xAs/InyAl1-yAs multiple quantum wells

Lee, DU; Jin, JY; Yun, TY; Kim, TW; Lee, HS; Kwon, MS; Lee, JeongYong, JOURNAL OF MATERIALS SCIENCE, v.40, pp.3843 - 3846, 2005-07

527
Atomic Arrangements of Asymmetrically-tilted Grain Boundaries in 30 degrees Rotation Domains of ZnO Thin Films Grown on n-Si Substrates

Yuk, Jong Min; No, Y.S.; Kim, T.W.; Kim, J.Y.; Choi, W.K., JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.55, no.1, pp.246 - 249, 2009

528
Atomic Chirality and a Materials Revolution

Yeom, Jihyeon, ACCOUNTS OF MATERIALS RESEARCH, v.2, no.7, pp.471 - 476, 2021-07

529
Atomic crystal structure of ordered In3Sb1Te2 ternary alloy studied by high-resolution transmission electron microscopy

Kim, Chung-Soo; Lee, Jeong-Yong; Kim, Yong-Tae, APPLIED PHYSICS LETTERS, v.100, no.15, 2012-04

530
Atomic diffusion induced degradation in bimetallic layer coated cemented tungsten carbide

Peng, Zirong; Rohwerder, Michael; Choi, Pyuck-Pa; Gault, Baptiste; Meiners, Thorsten; Friedrichs, Marcel; Kreilkamp, Holger; et al, CORROSION SCIENCE, v.120, pp.1 - 13, 2017-05

531
Atomic Layer Deposition Assisted Pattern Multiplication of Block Copolymer Lithography for 5 nm Scale Nanopatterning

Moon, Hyoung Seok; Kim, Juyoung; Jin, Hyeong Min; Lee, Woo Jae; Choi, Hyeon Jin; Mun, Jeong Ho; Choi, Young Joo; et al, ADVANCED FUNCTIONAL MATERIALS, v.24, no.27, pp.4343 - 4348, 2014-07

532
Atomic layer deposition assisted sacrificial template synthesis of mesoporous TiO2 electrode for high performance lithium ion battery anodes

Hong, Ki Joo; Kim, Sang Ouk, ENERGY STORAGE MATERIALS, v.2, pp.27 - 34, 2016-01

533
Atomic Layer Deposition Encapsulated Activated Carbon Electrodes for High Voltage Stable Supercapacitors

Hong, Ki Joo; Cho, Moonkyu; Kim, Sang-Ouk, ACS APPLIED MATERIALS INTERFACES, v.7, no.3, pp.1899 - 1906, 2015-01

534
Atomic layer deposition of Al2O3 thin films using trimethylaluminum and isopropyl alcohol

Jeon, WS; Yang, S; Lee, CS; Kang, Sang-Won, JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.149, no.6, pp.306 - 310, 2002-06

535
Atomic Layer Deposition of Aluminum Thin Films Using an Alternating Supply of Trimethylaluminum and a Hydrogen Plasma

Lee, Yong Ju; Kang, Sang-Won, ELECTROCHEMICAL AND SOLID STATE LETTERS, v.5, no.10, pp.C91 - C93, 2002-08

536
Atomic layer deposition of environmentally benign SnTiOx as a potential ferroelectric material

Chang, Siliang; Selvaraj, Sathees Kannan; Choi, Yoon-Young; Hong, Seungbum; Nakhmanson, Serge M.; Takoudis, Christos G., JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, v.34, no.1, 2016-01

537
Atomic Layer Deposition of Inorganic Thin Films on 3D Polymer Nanonetworks

Ahn, Jinseong; Ahn, Changui; Jeon, Seokwoo; Park, Junyong, APPLIED SCIENCES-BASEL, v.9, no.10, pp.1 - 17, 2019-05

538
Atomic layer deposition of nickel by the reduction of preformed nickel oxide

Chae, Junghun; Park, Hyuong-Sang; Kang, Sang-Won, JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.5, no.6, pp.C64 - C66, 2002-06

539
Atomic layer deposition of ruthenium thin films for copper glue layer

Kwon, OK; Kim, JH; Park, HS; Kang, SW, JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.151, no.2, pp.G109 - G112, 2004-01

540
Atomic layer deposition of silicon oxide thin films by alternating exposures to Si(2)Cl(6) and O(3)

Lee, Seung-Won; Park, Kwangchol; Han, Byeol; Son, Sang-Ho; Rha, Sa-Kyun; Park, Chong-Ook; Lee, Won-Jun, ELECTROCHEMICAL AND SOLID STATE LETTERS, v.11, no.7, pp.23 - 26, 2008

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