THE EFFECTS OF DEPOSITION VARIABLES ON DEPOSITION RATE IN THE CHEMICAL VAPOR-DEPOSITION OF SILICON-NITRIDE
- Publisher
- ELSEVIER SCIENCE SA LAUSANNE
- Issue Date
- 1987-12
- Language
- English
- Article Type
- Article
- Citation
THIN SOLID FILMS, v.155, no.1, pp.87 - 95
- ISSN
- 0040-6090
- Appears in Collection
- RIMS Journal Papers
- Files in This Item
- There are no files associated with this item.
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