FinFET Process Refinements for Improved Mobility and Gate Work Function Engineering
- Publisher
- IEEE
- Issue Date
- 2002-12
- Language
- ENG
- Citation
IEEE IEDM Technical Digest, pp.259 - 262
- Appears in Collection
- EE-Conference Papers(학술회의논문)
- Files in This Item
- FinFET%20Process%20Refinements%20for%20Improved...(419.9 kB)Download
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.