| 1 | 193-nm photoresists based on norbornene copolymers with derivatives of bile acid Kim, Jin-Baek; Lee, BW; Yun, HJ; Kwon, YG, CHEMISTRY LETTERS, v.149, pp.414 - 415, 2000-04 |
| 2 | Arrays of self-assembled monolayers for studying inhibition of bacterial adhesion Qian, XP; Metallo, SJ; Choi, Insung; Wu, HK; Liang, MN; Whitesides, GM, ANALYTICAL CHEMISTRY, v.74, no.8, pp.1805 - 1810, 2002-04 |
| 3 | Binding behaviors of protein on spatially controlled poly[oligo(ethylene glycol) methacrylate] brushes grafted from mixed self-assembled monolayers on gold Jeong, Seung Pyo; Lee, Bong Soo; Kang, Sung Min; Ko, Sangwon; Choi, Insung; Lee, Jungkyu K., CHEMICAL COMMUNICATIONS, v.50, no.40, pp.5291 - 5293, 2014-05 |
| 4 | Fluoro-N,N,N ,N -tetramethylformamidinium hexafluorophosphate: A reagent for formation of interchain carboxylic anhydrides on self-assembled monolayers Chi, YS; Choi, Insung, LANGMUIR, v.22, no.16, pp.6956 - 6960, 2006-08 |
| 5 | Photosensitive polymer brushes grafted onto PTFE film surface for micropatterning of proteins Yun, Je-Moon; Jung, Chan-Hee; Kim, Dong-Ki; Hwang, In-Tae; Choi, Jae-Hak; Ganesan, Ramakrishnan; Kim, Jin-Baek, JOURNAL OF MATERIALS CHEMISTRY, v.20, no.10, pp.2007 - 2012, 2010 |
| 6 | Poly(5-((2-trimethylsilyl-2-propyl)oxycarbonyl)-norbornene-co-maleic anhydride) for 193-nm lithography Kim, Jin-Baek; Lee, JJ; Kang, JS, POLYMER, v.41, no.18, pp.6939 - 6942, 2000-08 |
| 7 | Reactivity control of carboxylic acid-terminated self-assembled monolayers on gold: Acid fluoride versus interchain carboxylic anhydride Chi, YS; Choi, Insung, LANGMUIR, v.21, no.25, pp.11765 - 11772, 2005-12 |
| 8 | Synthesis and lithographic evaluation of poly [(methaerylic acid tert-butyl cholate ester)-co-(-gamma-butyrolactone-2-yl methacrylate)] Kim, Jin-Baek; Ko, JS; Choi, JH; Jang, JH; Oh, TH; Kim, HW; Lee, BW, POLYMER, v.45, no.16, pp.5397 - 5401, 2004-07 |
| 9 | Synthesis of a novel methacrylate, (1,4-dioxa-8-methacrylate amide spiro [4,5] decane) monomer and its co-polymerization with t-butyl-3 alpha-methacryloxy-7 alpha, 12 alpha-dihydroxy-5 beta cholan-24-oate for 193 nm photoresist Karak, N; Ko, JS; Kim, Jin-Baek, JOURNAL OF POLYMER MATERIALS, v.19, pp.365 - 372, 2002-12 |
| 10 | Synthesis of poly(2-trimethylsilyl-2-propyl methacrylate) and their application as a dry-developable chemically amplified photoresist Kim, Jin-Baek; Kim, H; Choi, JH, POLYMER, v.40, no.6, pp.1617 - 1621, 1999-03 |
